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- 09:34, 19 February 2015 Paphol talk contribs uploaded File:Boron doped poly thickness .png (Poly-Si thickness at 7 sccm and 30 sccm B2H6 Flow. Result from Trine H. Christensen DTU Space)
- 09:30, 19 February 2015 Paphol talk contribs uploaded File:Rs AmorBor vs PolyBor .png (Sheet resistance on Boron doped poly-si using "POLYBOR" recipe, deposition time : 30 minutes, B2H6 flow at 7 sccm and 30 sccm, anneal : 950C 1 hour and Boron doped a-Si using "AMORBOR" recipe, Deposition time : 75 minutes, B2H6 flow at 7sccm, anneal: 9...)
- 15:04, 17 February 2015 Paphol talk contribs uploaded File:Rs on 4in boron doped poly .png (Sheet resistance on Boron doped poly-si using "POLYBOR" recipe, deposition time : 30 minutes, B2H6 flow at 7 sccm and 30 sccm, anneal : 950C 1 hour. Result from Trine H. Christensen DTU Space)
- 10:25, 11 February 2015 Paphol talk contribs uploaded a new version of File:Doped poly.pdf
- 09:50, 11 February 2015 Paphol talk contribs uploaded File:Doped poly.pdf (Recipe "DOPEPOLY" Deposition time : 30 minutes Polysilicon thickness :104 nm Substrate : 110nm Silicon dioxide on N-type si(100))
- 11:57, 30 September 2014 Paphol talk contribs uploaded File:RASIRC Steam generator.pdf (Integrated unit for precise flow rate steam generation and delivery)
- 11:35, 29 September 2014 Paphol talk contribs uploaded File:Calculation for Wet oxidation for Anneal Oxide(C1).xlsx (Know the expected oxide thickness, calculate the oxidation time. Or Know the oxidation time, calulate the oxide thinkness.)
- 11:29, 29 September 2014 Paphol talk contribs uploaded File:Steamer process develop fig5.png (The percent of film non-uniformity variation with growth time in different temperature. (left) Over the boat and (right) over the wafer)
- 11:27, 29 September 2014 Paphol talk contribs uploaded File:Steamer process develop fig4.png (Silicon dioxide thickness variation with growth time (from 0 to 720 minutes) in different temperature)
- 11:26, 29 September 2014 Paphol talk contribs uploaded File:Steamer process develop fig3.png (The percent different of the silicon dioxide thickness at the steamer flow rate at 10 and 25 l/min variation with temperature)
- 11:26, 29 September 2014 Paphol talk contribs uploaded File:Steamer process develop fig2.png (The average silicon dioxide thickness and the percent of film non-uniformity over the wafer variation with process time, steamer flow rate and temperature.)
- 11:19, 29 September 2014 Paphol talk contribs uploaded File:Steamer process develop fig1.png (The average silicon dioxide thickness and the percent of film non-uniformity over the boat variation with process time, steamer flow rate and temperature.)
