A1 Boron drive in furnace: positioned in cleanroom 2
A1 Furnace boron drive-in is a Tempress horizontal furnace for oxidation of silicon wafers, annealing of the grown oxide, drive-in of boron after a pre-deposition, oxidation of the boron phase layer. Boron pre-deposition takes place in the A2 Furnace boron pre-dep. It can also be used for drive in of boron which has been ion implanted.
A1 is the top furnace tube in the A-stack positioned in cleanroom 2. The A-stack together with furnace C1 are the cleanest of all our furnaces. Please be aware of which substrates are allowed to enter this furnace. Check the cross contamination chart. If you are in doubt, please ask one from the furnace team.
Overview of the performance of the boron drive-in furnace and some process related parameters
Purpose
Drive-in of boron, oxidation of silicon and boron phase layer and annealing of the oxide
Oxidation:
Dry
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)
Performance
Film thickness
Dry SiO2: 50Å to ~2000Å (takes too long to make it thicker)
Wet SiO2: 50Å to ~3µm ((takes too long to make it thicker)
Process parameter range
Process Temperature
800-1150 oC
Process pressure
1 atm
Gasses on the system
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Substrates
Batch size
1-30 4" wafer (or 2" wafers) per run
Substrate material allowed
Silicon wafers (new from the box or RCA cleaned)
From A2 furnace directly (e.g. incl. Predep HF)
In doubt: look at the cross contamination sheet or ask one from the furnace team
