May 2013 Survey

Survey introduction

The May 2013 survey was the ninth survey carried out using a format where individual cleanroom users were asked about their view on various parts of using DTU Danchip's facilities and in particular the cleanroom facilities.
The questionaire was send to 252 registered users (based on the logging of cleanroom use) unfortunately 5 of the e-mail adresses was obsolete and thus the mails bounced, which brought the total number of potential answers to 247 . In total 49 persons answered the questionaire which means an answer fraction of 19% regardless of whether or not the bounces should be included in the total.
This page deals with the comments given as part of the questionaire. Danchip values this feedback highly.

Comments

The comments appear here as they were written in the feedback field of the questionaire. In a few cases they have been anonymized or the worst spelling mistakes corrected.

Comment 1

The best SEM (Zeiss) is always overbooked and it is quite difficult to find a time slot if not planning the inspection in advance. When are the users of III-V semiconductors getting the new aligner? This event was mentioned in the last meeting with Danchip.

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Comment 2

Claus is the man

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Comment 3

Keep up the good work!

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Comment 4

I find it a waste of both time and chemicals to clean wafers before usage, since they are already clean and vacuum packed when they arrive. If 3rd parties wish for them to be cleaner, then let those person perform the extra cleaning process and not everyone who needs a wafer now and then.. Also: A lot of people don't use the logs. I have used the SEM (Zeiss) frequently and some days its booked from 8-19, but only one or two persons have logged it when I arrive after 19.

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Comment 5

It was a very educative and interesting experience. All the staff, the conditions, as well as, the cleanroom conditions were excellent contributing in a better understanding of the experiment.

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Comment 6

Some key equipment items are often out of use. e.g. MVD

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Comment 7

EVG-NIL and obducat have been down frequently. Pressure gauge problem in the III-V RIE makes me couldn't leave the machine all day. There're 3 SEMs but people only want to use Zeiss. That includes myself too because I could obtain the best image using Zeiss. However, if the other 2 can get the same quality image as in Zeiss, it'd help increase the equipment availability a lot.

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Comment 8

Availability of Equipment ... depends on the equipment! SEM-Zeiss is usually heavely booked and quick investigation of an etching result to proceed with further steps is impossible during normal work hours. A shoehorn placed next to the "take the shoes off line" would be helpfull. ;-) A better place for the wardrobe would be nice. Perhabs a little one in the corner next to the "take the shoes off line". .

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