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The Mask Design TPT
DTU Nanolab offers a Tool Package Training in Mask Design.
The course is for all users who intend to design their own masks for lithography.
For instructions please download the exercise for the design program you want to learn:
| Mask Design Training
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| Schedule
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- Self-study using screen cast videoes demonstrating the use of either CleWin og L-edit.
- An exercise where you are guided through the design of a mask.
- All materials are provided below.
- An optional ½ hour Q&A session with an expert on mask layout. You can make an appointment after finishing the exercise.
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| Location
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- Anywhere you like. DTU network access required.
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| Qualified Prerequisites
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- Basic knowledge about micro-lithography
- Access to a computer where you can install Clewin or L-edit
- Danchip provide free access to use Clewin 5 through a network license.
- If you want to use L-edit you will need a valid license of your own
- Basic knowledge about micro-fabrication techniques
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| Preparations
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None
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| Course Responsible
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Fabrication support at DTU Nanolab.
If you have questions you can contact us by e-mailing fabricationsupport@nanolab.dtu.dk.
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| Learning Objectives
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- Get acquainted with either Clewin 5 or L-edit mask design programs
- construct and manipulate basic shapes (rectangles, polygons, circles etc.)
- use mask layers and hierarchical mask design
- choose mask polarity and orientation for different resist types and Front/Back-side alignment
- select and design appropriate test structures and alignment marks for a process
- make a chip/wafer layout usable for dicing
- export the layout to cif or gds files with appropriate layer names
- make a mask order
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Material for the Mask Design course
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Literature
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Training videos
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Exercises
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