Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions

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*[[Specific Process Knowledge/Etch/DRIE-Pegasus/SOIetch|SOI etch]]
*[[Specific Process Knowledge/Etch/DRIE-Pegasus/SOIetch|SOI etch]]


== Other processes ==
'''Other etch processes'''


*[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch|Nanoetch]]


*[[Specific Process Knowledge/Etch/DRIE-Pegasus/slopedsidewalls|Etches that produce positively sloped sidewalls for imprinting purposes]]


=== Nanoetching ===
*[[Specific Process Knowledge/Etch/DRIE-Pegasus/Waferthinning| Maskless reduction of wafer thicknesses]]
 
[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch|Nanoetch]]
 
=== Wafer thinning ===
 
=== Sloped sidewalls ===
For injection molding purposes
 
 
== Processing challenges ==
 
=== Bonded wafers ===
 
== User manuals ==
 
* The Danchip user manual from LabManager is found [http://labmanager.danchip.dtu.dk/machine/machine_item.php?refpage=machlist&id=265 >Here<].
* The user manual provided by SPTS can be found here [[Media:SPTS Pegasus user manual.pdf|>HERE<]]


== Hardware information ==
== Hardware information ==

Revision as of 12:30, 26 November 2012

The DRIE Pegasus at Danchip

The SPTS Pegasus in the Danchip cleanroom

The Bosch process

The DRIE Pegasus is a state-of-art silicon dry etcher that offers outstanding performance in terms of etch rate, uniformity etc. It uses the so-called Bosch process to achieve excellent control of the etched features. Click here for more fundamental information of the system.

User manuals etc.

The user manual, quality control procedure and the results may all be found on the DRIE-Pegasus LabManager page.

Important information

In August 2011 we introduced a new set of rules regarding the loading of wafers. In you were trained prior to this, you can find more information here.

Acceptance test

The instrument was opened for users in April 2010 when the acceptance test was signed. This was based on the performance of five standard recipes (A, B, C, D and SOI) that are further examined below. The acceptance test report is found here.

Process information

Process notation

Describing a process recipe on the Pegasus may sometimes be difficult because of the great flexibility of the instrument. A compact and precise notation is therefore required for the recipes. Click here to find a short description of the official SPTS notation.

Standard recipes

Other etch processes

Hardware information

Hardware Information - Overview.

Hardware Information - Detailed.

The Advantages the Pegasus has over existing Si etchers.

Robot Handling System Information .

Process applications

MEMS in Aerospace.

Bio Medical.

MEMS in Energy.

Nanotechnology.

Packaging Applications.

General Applications.


Further info:

FAQ (Under construction)