Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

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	~~For our example process we will use~~ a standard 4” silicon wafer and ~~coat it~~ with 180 nm CSAR on the fully automatic Gamma E-beam & UV coater using recipe 4318. [https://youtu.be/3JhM3rmLVpA A video demonstrating usage of our Gamma coaters can be found here.] Bear in mind the video shows the UV resist coater and not the E-beam resist coater but they are identical in operation.		The tutorial job uses a standard 4” silicon wafer and the wafer is coated with 180 nm CSAR on the fully automatic Gamma E-beam & UV coater using recipe 4318. [https://youtu.be/3JhM3rmLVpA A video demonstrating usage of our Gamma coaters can be found here.] Bear in mind the video shows the UV resist coater and not the E-beam resist coater but they are identical in operation.

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