LabAdviser/Courses/Mask Design: Difference between revisions

Revision as of 11:08, 3 September 2019

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DTU Danchip offers a Tool Package Training in Mask Design. The course is for all users who intend to design their own masks for lithography.

For instructions please download the exercise for the design program you want to learn:

Mask Design Training
Schedule	Self-study using screen cast videoes demonstrating the use of either CleWin og L-edit. An exercise where you are guided through the design of a mask. All materials are provided below. An optional ½ hour Q&A session with an expert on mask layout. You can make an appointment after finishing the exercise.
Location	Anywhere you like. DTU network access required.
Qualified Prerequisites	Basic knowledge about micro-lithography Access to a computer where you can install Clewin or L-edit Danchip provide free access to use Clewin 5 through a network license. If you want to use L-edit you will need a valid license of your own Basic knowledge about micro-fabrication techniques
Preparations	None
Course Responsible	Customer support at DTU Danchip. If you have questions you can contact us by e-mailing danchipsupport@danchip.dtu.dk.
Learning Objectives	Get acquainted with either Clewin 5 or L-edit mask design programs construct and manipulate basic shapes (rectangles, polygons, circles etc.) use mask layers and hierarchical mask design choose mask polarity and orientation for different resist types and Front/Back-side alignment select and design appropriate test structures and alignment marks for a process make a chip/wafer layout usable for dicing export the layout to cif or gds files with appropriate layer names make a mask order

Literature

Training videos

Exercises

Exercise for Clewin 5
Mask layout file for Clewin Exercise (Right click and Use "save link as...")
Alignment and test structures for Clewin Exercise (Right click and Use "save link as..."). This file can be open as Library in the Clewin exercise file.
Exercise for L-Edit

@@ Line 97: / Line 97: @@
 * [[media:TPT- Mask Design - Exercises for Clewin v1.pdf|Exercise for Clewin 5 ]]
 * [[media:Exercise_Pressure_sensor.cif‎|Mask layout file for Clewin Exercise]] (Right click and Use "save link as...")
-* [[media:Alignment_and_test_structures.cif‎|Alignment and test structures for Clewin Exercise]] (Right click and Use "save link as..."). This file can be open as Library in the exercise file.
+* [[media:Alignment_and_test_structures.cif‎|Alignment and test structures for Clewin Exercise]] (Right click and Use "save link as..."). This file can be open as Library in the Clewin exercise file.
 * [[media:TPT - Mask Design - Exercises for L-edit v1.pdf |Exercise for L-Edit]]