Specific Process Knowledge/Thin film deposition/Deposition of Titanium Oxide: Difference between revisions
| Line 63: | Line 63: | ||
!Deposition rate | !Deposition rate | ||
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*3.0-3. | *3.0-3.5 nm/min (reactive sputtering) | ||
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*3 - 5 nm/min (RF sputtering) | *3-5 nm/min (RF sputtering) | ||
*0.3 - 0. | *0.3 - 0.5 nm/min | ||
| | | | ||
* 1 - 2 Å/s | * 1 - 2 Å/s | ||