Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions
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SIO etch (BHF with wetting agent) can also be used for etching silicon oxide. This is mainly for etching small holes. If you have wetting problems in BHF try the SIO etch. It is also a good idea to wet the sample in water for a few minutes before etching. | SIO etch (BHF with wetting agent) can also be used for etching silicon oxide. This is mainly for etching small holes. If you have wetting problems in BHF try the SIO etch. It is also a good idea to wet the sample in water for a few minutes before etching. | ||
Wafers with metals or other materials, not allowed in the dedicated oxide etch baths, can be etched using a '''plastic''' in Fume hood | Wafers with metals or other materials, not allowed in the dedicated oxide etch baths, can be etched using a '''plastic''' in Fume hood 01 or 02 (Acids/bases) in D-3. Samples with III-V materials (e.g. InP and GaAs) must be etched in Fume hood 07: III-V Avids/bases in D-3. | ||
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'''The user manual for Oxide etch 1: BHF, APV's and contact information can be found in LabManager''' [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=389 by clicking here] | '''The user manual for Oxide etch 1: BHF, APV's and contact information can be found in LabManager''' [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=389 by clicking here] | ||
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*Etching of silicon oxide - especially for etching small holes | *Etching of silicon oxide - especially for etching small holes | ||
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|style="background:LightGrey; color:black"|Link to safety APV and SDS | |style="background:LightGrey; color:black"|Link to safety APV and SDS (You must be logged in to Kemibrug to view SDSs) | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*:[http://labmanager.danchip.dtu.dk/d4Show.php?id=1897&mach=64 see APV here] | *:[http://labmanager.danchip.dtu.dk/d4Show.php?id=1897&mach=64 see APV here] | ||
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|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*:[http://labmanager.danchip.dtu.dk/d4Show.php?id=1897&mach=64 see APV here] | *:[http://labmanager.danchip.dtu.dk/d4Show.php?id=1897&mach=64 see APV here] | ||
*:[ | *:[https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhERkVKS0lNTFRkJWMyJTg3JTdjdiVjMiU4MyU3ZSVjMiU4OHYlYzIlODklN2UlYzIlODQlYzIlODMlYzIlODglNWVZUkk=#K see SDS here] | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance | ||