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Specific Process Knowledge/Thin film deposition/Deposition of Titanium: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Paphol (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
912 edits
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! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Alcatel|Alcatel]])
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Alcatel|Alcatel]])
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]])
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]])
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Multisource PVD|PVD co-sputter/evaporation]])
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Physimeca|Physimeca]])
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Physimeca|Physimeca]])
! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]])
! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]])
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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
! General description
! General description
|E-beam deposition of Titanium
|E-beam deposition of Titanium
|E-beam deposition of Titanium
|E-beam deposition of Titanium
|E-beam deposition of Titanium
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|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
! Pre-clean
! Pre-clean
|RF Ar clean
|RF Ar clean
|RF Ar clean
|RF Ar clean
|RF Ar clean
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|10Å to 1µm*
|10Å to 1µm*
|10Å to 1 µm*
|10Å to 1 µm*
|10Å to 2000Å
|10Å to 1000Å
|10Å to 1000Å
|.
|.
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|2Å/s to 15Å/s
|2Å/s to 15Å/s
|10Å/s to 15Å/s
|10Å/s to 15Å/s
|About 1Å/s
|About 10Å/s  
|About 10Å/s  
|Depending on process parameters, see [[Sputtering of Ti in Wordentec|here]].
|Depending on process parameters, see [[Sputtering of Ti in Wordentec|here]].
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*6x4" wafers or
*6x4" wafers or
*6x6" wafers
*6x6" wafers
|
*12x2" wafers or
*12x4" wafers or
*4x6" wafers
|
|
*1x 2" wafer or
*1x 2" wafer or
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|  
|  
* Silicon wafers
* Quartz wafers
* Pyrex wafers
|
* Silicon wafers  
* Silicon wafers  
* Quartz wafers  
* Quartz wafers  
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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!Allowed materials
!Allowed materials
|
* Silicon oxide
* Silicon (oxy)nitride
* Photoresist
* PMMA
* Mylar
* SU-8
* Metals
|
|
* Silicon oxide  
* Silicon oxide  
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|
|
|
|
|Only very thin layers (up to 100nm).
|
|
|
|
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