Specific Process Knowledge/Thin film deposition: Difference between revisions
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| align="left" valign="top" style="background:#DCDCDC;"|''' Alloys''' | | align="left" valign="top" style="background:#DCDCDC;"|''' Alloys''' | ||
| align="left" valign="top" style="background:LightGray"|''' Polymers''' | | align="left" valign="top" style="background:LightGray"|''' Polymers''' | ||
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[[/Deposition of Silicon Nitride|Silicon Nitride]] - ''and oxynitride'' <br/> | |||
[[/Deposition of Silicon Oxide|Silicon Oxide]]<br/> | |||
[[/Deposition of Titanium Oxide|Titanium Oxide]]<br/> | |||
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[[/Deposition of Silicon|Silicon]] | |||
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[[/Deposition of Aluminium|Aluminium]] <br/> | |||
[[/Deposition of Titanium|Titanium]]<br/> | |||
[[/Deposition of Chromium|Chromium]]<br/> | |||
[[/Deposition of Nickel|Nickel]]<br/> | |||
[[/Deposition of Copper|Copper]]<br/> | |||
[[/Deposition of Germanium|Germanium]]<br/> | |||
[[/Deposition of Molybdenum|Molybdenum]]<br/> | |||
[[/Deposition of Palladium|Palladium]]<br/> | |||
[[/Deposition of Silver|Silver]]<br/> | |||
[[/Deposition of Tin|Tin]]<br/> | |||
[[/Deposition of Tantalum|Tantalum]]<br/> | |||
[[/Deposition of Tungsten|Tungsten]]<br/> | |||
[[/Deposition of Platinum|Platinum]]<br/> | |||
[[/Deposition of Gold|Gold]]<br/> | |||
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[[/Deposition of TiW|TiW]] alloy (10%/90% by weight) <br/> | |||
[[/Deposition of NiCr|NiCr]] alloy <br/> | |||
[[/Deposition of AlTi|AlTi]] alloy | |||
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[[Specific Process Knowledge/Photolithography/SU8|SU8]]<br/> | |||
Antistiction coating <br/> | |||
Topas <br/> | |||
PMMA | |||
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| align="left" valign="top" style="background:LightGray"|''' PVD''' | |||
| align="left" valign="top" style="background:#DCDCDC;"|''' LPCVD''' | |||
| align="left" valign="top" style="background:LightGray"|''' PECVD''' | |||
| align="left" valign="top" style="background:#DCDCDC;"|''' Coaters''' | |||
| align="left" valign="top" style="background:LightGray"|''' Others''' | |||
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