Specific Process Knowledge/Thin film deposition/Deposition of Aluminium: Difference between revisions
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*[[/Sputter rates for Al|Sputtering of Aluminium in the Wordentec]] | *[[/Sputter rates for Al|Sputtering of Aluminium in the Wordentec]] | ||
*[[/Al sputtering in Sputter System (Lesker) |Al sputtering in Sputter System (Lesker)]] | |||
==E-beam evaporation of Aluminium== | ==E-beam evaporation of Aluminium== | ||
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*[[/Al Ebeam evaporation in Temescal |E-beam evaporation of Al in Temescal]] | *[[/Al Ebeam evaporation in Temescal |E-beam evaporation of Al in Temescal]] | ||
*[[/Notes on low oxygen content in e-beam prepared Al thin films|Notes on low oxygen content in e-beam prepared Al thin films (Temescal)]] | *[[/Notes on low oxygen content in e-beam prepared Al thin films|Notes on low oxygen content in e-beam prepared Al thin films (Temescal)]] | ||