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==Stress in films deposited at high temperature==
==Stress in films deposited at high temperature==
In 2017, Radu Malureanu measured a tensile stress of about 100 MPa on thin films of Invar deposited at 600 °C. Read more about stress in thin films deposited with the Lesker sputter system [http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Lesker/Stress_dependence_on_sputter_parameters_in_the_Lesker_sputter_system here].
In 2017, Radu Malureanu measured a tensile stress of about 100-200 MPa on thin films of Invar deposited at 600 °C with varying thicknesses between 120 and 330 nm, DC power of 80 or 120 W and Ar pressure of 5 or 10 mTorr.  
 
Read more about stress in thin films deposited with the Lesker sputter system [http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Lesker/Stress_dependence_on_sputter_parameters_in_the_Lesker_sputter_system here], where you will also find further reading about stress in sputtered films in general.
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