Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions
Appearance
| Line 134: | Line 134: | ||
''By Bjarke Thomas Dalslet @Nanotech.dtu.dk'' | ''By Bjarke Thomas Dalslet @Nanotech.dtu.dk'' | ||
The Lesker CMS 18 sputter system can produce films in a wide range of qualities. The quality of a film depends strongly on the substrate (lattice matching), but also on the energy the sputtered material can utilize for annealing. | The Lesker CMS 18 sputter system can produce films in a wide range of crystalline qualities. The crystalline quality of a film depends strongly on the substrate (lattice matching), but also on the energy the sputtered material can utilize for annealing. | ||
You will find detailed information on film quality optimization for NiFe films [[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_NiFe|here]]. | You will find detailed information on film quality optimization for NiFe films [[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_NiFe|here]]. | ||