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| *The [[/XRD_SmartLab|Rigaku SmartLab]] primarily for thin film analysis | | *The [[/XRD_SmartLab|Rigaku SmartLab]] primarily for thin film analysis |
| *The [[/XRD_Powder|XRD Powder setup]] primarily for analysis of bulk materials and powders | | *The [[/XRD_Powder|XRD Powder setup]] primarily for analysis of bulk materials and powders |
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| == XRD SmartLab ==
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| The Rigaku SmartLab is an advanced XRD for measuring on thin films. All thin films can be measured without fixating the sample, as the system has a so called In-Plane arm.
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| [[image:XRD_SmartLab.jpg|200x200px|right|thumb|The XRD SmartLab located in cleanroom F-2]]
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| '''The user manual(s), user APV(s), technical information, and contact information can be found in LabManager:'''
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| [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=428 XRD SmartLab in LabManager]
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| [http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Characterization/XRD/Process_Info Process information]
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| ==Software for analysis==
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| The software packages used for data analysis are available on the equipment computer, but we recommend that you install it on your personal computer. To run the software you need a USB dongle with a license on, these can be borrowed from Rebecca and Kristian in room 347-077. We only have 9 dongles available, so when you are done please return the dongle to Nanolab.
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| The software can be found on "CleanroomDrive\_Equipment\XRD\Rigaku software\RILauncher", it should be possible to install the software without a dongle. To use the software you have to log in. The user is: Administrator. There is no password.
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| ==Equipment performance and process related parameters==
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| {| border="2" cellspacing="0" cellpadding="2"
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| !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
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| |style="background:WhiteSmoke; color:black"|<b>XRD SmartLab</b>
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| |style="background:WhiteSmoke; color:black"|<b>XRD Powder</b>
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| |-
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| !style="background:silver; color:black;" align="center" width="60"|Purpose
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| |style="background:LightGrey; color:black"| Crystal structure analysis and thin film thickness measurement
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| |style="background:WhiteSmoke; color:black"|
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| *Phase ID
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| *Crystal Size
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| *Crystallinity
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| *Quality and degree of orientation
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| *3D orientation
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| *Latice strain
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| *Composition
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| *Twist
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| *3D lattice constant
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| *Thickness
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| *Roughness
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| *Density
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| |style="background:WhiteSmoke; color:black"|
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| *Phase ID
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| *Crystal Size
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| *Crystallinity
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| |-
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| !style="background:silver; color:black" align="center" valign="center" rowspan="6"|X-ray generator
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| |style="background:LightGrey; color:black"|
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| Maximum rated output
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| |style="background:WhiteSmoke; color:black"|
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| 3 kW
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| |style="background:WhiteSmoke; color:black"|
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| 600 W
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| |-
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| |style="background:LightGrey; color:black"|
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| Rated tube voltage
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| |style="background:WhiteSmoke; color:black"|
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| 20 to 45 kV
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| |style="background:WhiteSmoke; color:black"|
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| 40 kV
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| |-
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| |style="background:LightGrey; color:black"|
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| Rated tube current
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| |style="background:WhiteSmoke; color:black"|
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| 2 to 60 mA
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| |style="background:WhiteSmoke; color:black"|
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| 15 mA
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| |-
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| |style="background:LightGrey; color:black"|
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| Type
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| |style="background:WhiteSmoke; color:black"|
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| Sealed tube
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| |style="background:WhiteSmoke; color:black"|
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| Sealed tube
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| |-
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| |style="background:LightGrey; color:black"|
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| Target
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| |style="background:WhiteSmoke; color:black"|
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| Cu
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| |style="background:WhiteSmoke; color:black"|
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| Cu
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| |-
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| |style="background:LightGrey; color:black"|
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| Focus size
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| |style="background:WhiteSmoke; color:black"|
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| 0.4 mm x 8 mm (Line/Point)
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| |style="background:WhiteSmoke; color:black"|
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| 0.4 mm x 12 mm (Line)
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| |-
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| !style="background:silver; color:black" align="center" valign="center" rowspan="5"|Goniometer
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| |style="background:LightGrey; color:black"|
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| Scanning mode
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| |style="background:WhiteSmoke; color:black"|
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| incident / receiver coupled or independent
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| |style="background:WhiteSmoke; color:black"|
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| incident / receiver coupled
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| |-
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| |style="background:LightGrey; color:black"|
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| Goniomenter radius
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| |style="background:WhiteSmoke; color:black"|
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| 300 mm
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| |style="background:WhiteSmoke; color:black"|
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| 145 mm
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| |-
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| |style="background:LightGrey; color:black"|
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| Minimum step size
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| |style="background:WhiteSmoke; color:black"|
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| 0.0001° (0.36")
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| |style="background:WhiteSmoke; color:black"|
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| 0.001° (3.6")
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| |-
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| |style="background:LightGrey; color:black"|
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| Sample stage
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| |style="background:WhiteSmoke; color:black"|
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| *χ:-5~+95°
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| *φ:0~360°
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| *Z:-4~+1 mm
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| *X,Y:±50 mm for a 100 mm wafer
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| *Rx,Ry:-5~+5°
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| |style="background:WhiteSmoke; color:black"|
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| Fixed with rotation
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| |-
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| |style="background:LightGrey; color:black"|
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| Sample size
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| |style="background:WhiteSmoke; color:black"|
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| Diameter: 150 mm
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| Thickness: 0~21 mm
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| |style="background:WhiteSmoke; color:black"|
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| Powders
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| !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Optics
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| |style="background:LightGrey; color:black"|Incident side
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| |style="background:WhiteSmoke; color:black"|
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| *Cross Beam Optics(CBO)
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| *Ge(220)x2 monochromator
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| *In-Plane Parallel Slit Collimator (PSC)
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| *Soller slit
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| *Variable divergence slit
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| |style="background:WhiteSmoke; color:black"|
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| *0.04° soller slit
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| *Ni and Cu filter
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| *Divergence slits
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| *Beam mask
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| |-
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| |style="background:LightGrey; color:black"|Receiver side
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| |style="background:WhiteSmoke; color:black"|
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| *Automatic variable scattering slit
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| *Automatic variable receiver slit
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| *Parallel slit analysers (PSA)
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| *Ge(220)x2 analyser
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| |style="background:WhiteSmoke; color:black"|
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| *0.04° soller slit
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| *Ni filter
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| |-
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| !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
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| |style="background:LightGrey; color:black"|Substrate size
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| |style="background:WhiteSmoke; color:black"|
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| up to 150 mm wafers
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| |style="background:WhiteSmoke; color:black"|
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| Only for powders
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| |-
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| | style="background:LightGrey; color:black"|Allowed materials
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| |style="background:WhiteSmoke; color:black"|
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| All materials
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| |style="background:WhiteSmoke; color:black"|
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| All materials have to be approved
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| |-
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| |}
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XRD at Nanolab
We have two XRD setups in building 346:
