Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of Titanium: Difference between revisions

← Older editNewer edit →
VisualWikitext
Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,760 edits
Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,760 edits
Line 16: Line 16:
! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]])
! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]])
! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Lesker|Lesker]])
! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Lesker|Lesker]])
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/III-V Dielectric evaporator|III-V Dielectric evaporator]])
|-  
|-  


Line 26: Line 25:
|Sputter deposition of Titanium
|Sputter deposition of Titanium
|Sputter deposition of Titanium
|Sputter deposition of Titanium
|E-beam  deposition of Titanium
|-
|-


Line 36: Line 34:
|RF Ar clean
|RF Ar clean
|RF Ar clean
|RF Ar clean
| 
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
Line 45: Line 42:
|.
|.
|.
|.
|10Å to 1000Å
|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
Line 54: Line 50:
|Depending on process parameters, see [[Sputtering of Ti in Wordentec|here]].
|Depending on process parameters, see [[Sputtering of Ti in Wordentec|here]].
|Depending on process parameters, about 1 Å/s.
|Depending on process parameters, about 1 Å/s.
|About 1Å/s
|-
|-


Line 79: Line 74:
* Up to 1x6" wafers  
* Up to 1x6" wafers  
|
|
* 2" wafer or
* Smaller pieces
|-


|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
Line 96: Line 88:
|
|
* III-V materials
* III-V materials
* Silicon wafers
* Quartz wafers
* Pyrex wafers
|
* Silicon wafers  
* Silicon wafers  
* Quartz wafers  
* Quartz wafers  
Line 149: Line 137:
* Photoresist  
* Photoresist  
* Metals  
* Metals  
|
* Silicon oxide
* Silicon (oxy)nitride
* Photoresist


|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Titanium"