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Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
Line 45: Line 45:
*[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch|Nanostructure etches including nano1.42]]
*[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch|Nanostructure etches including nano1.42]]


*[[Specific Process Knowledge/Etch/DRIE-Pegasus/DUVetches|Etch processes with DUV masks]]
*[[Specific Process Knowledge/Etch/DRIE-Pegasus/DUVetch|Etch processes with DUV masks]]


*[[Specific Process Knowledge/Etch/DRIE-Pegasus/Barc|BARC etches]]
*[[Specific Process Knowledge/Etch/DRIE-Pegasus/Barc|BARC etches]]
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