Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions
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All though PECVD2 and 3 are very similar you should not expect to transfer a recipe between the systems and get the exact same result. | All though PECVD2 and 3 are very similar you should not expect to transfer a recipe between the systems and get the exact same result. | ||
== Recipes on PECVD1 and PECVD3 == | == Recipes on PECVD1(will be removed soon), PECVD2 and PECVD3 == | ||
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD#Recipes on PECVD1 for deposition of silicon oxides|Recipes on PECVD1 for deposition of silicon oxides]] | *[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD#Recipes on PECVD1 for deposition of silicon oxides|Recipes on PECVD1 for deposition of silicon oxides]] | ||
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD#Recipes on PECVD1 for deposition of silicon nitride and silicon oxynitride|Recipes on PECVD1 for deposition of silicon nitride and silicon oxynitride]] | *[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD#Recipes on PECVD1 for deposition of silicon nitride and silicon oxynitride|Recipes on PECVD1 for deposition of silicon nitride and silicon oxynitride]] | ||