Specific Process Knowledge/Characterization/Optical characterization: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@ | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Optical_characterization click here]''' | ||
[[Category: Equipment |Characterization Optical]] | [[Category: Equipment |Characterization Optical]] | ||
[[Category: Characterization|Optical]] | [[Category: Characterization|Optical]] | ||
==Comparison of the | ==Comparison of the methods== | ||
For comparison of the | For comparison of the methods for measuring optical constants and film thickness, see here: [[Specific Process Knowledge/Characterization/Measurement of film thickness and optical constants#Film_thickness_and_optical_constants_of_optical_transparent_films|Film thickness and optical constants of optical transparent films]] | ||
==Ellipsometer VASE and Ellipsometer M-2000V == | ==Ellipsometer VASE and Ellipsometer M-2000V == | ||
[[image:Ellipsometer_VASE_image.JPG|275x275px|right|thumb|Ellipsometer VASE: positioned in cleanroom | ''This section is written by Berit Herstrøm @ DTU Nanolab'' | ||
[[image:Ellipsometer_VASE_image.JPG|275x275px|right|thumb|Ellipsometer VASE: positioned in cleanroom A-1, {{photo1}}]] | |||
The ellipsometer VASE is actually a M2000XI-210 ellipsometer from J.A. Woollam Co., Inc.. We call it VASE (Variable Angle Spectroscopic Ellipsometry) because it can do spectroscopic ellipsometry at variable angles. <br/> | The ellipsometer VASE is actually a M2000XI-210 ellipsometer from J.A. Woollam Co., Inc.. We call it VASE (Variable Angle Spectroscopic Ellipsometry) because it can do spectroscopic ellipsometry at variable angles. <br/> | ||
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Ellipsometry is an indirect measurement so a model has to be fit to the data in order to obtain the film thickness and optical constants. To learn more about ellipsometry you can take a look at the [http://www.jawoollam.com/tutorial_1.html tutorial] provided by the J. A. Woollam Co. | Ellipsometry is an indirect measurement so a model has to be fit to the data in order to obtain the film thickness and optical constants. To learn more about ellipsometry you can take a look at the [http://www.jawoollam.com/tutorial_1.html tutorial] provided by the J. A. Woollam Co. | ||
Access to use the CompleteEASE software can be found using Remote Desktop connection to: | Access to use the CompleteEASE software can be found using Remote Desktop connection to: DTU-8CC0321MFL (you can only log on when you have the user competences in LabManager) or log on to https://remote.dtu.dk. There should be a connection via Citrix to DTU-8CC0321MFL. You will be prompted for user/password. | ||
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<!-- give the link to the equipment info page in LabManager: --> | <!-- give the link to the equipment info page in LabManager: --> | ||
[http://labmanager | [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=316 LabManager page for Ellipsometer VASE] <br/> | ||
[http://labmanager | [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=261 LabManager page for Ellipsometer M-2000V] | ||
<br clear="all" /> | <br clear="all" /> | ||
===More details=== | ===More details=== | ||
*[[/advanced ellipsometry|Examples of advanced use of the ellipsometer]] | * Before training: | ||
** First go through the Woollam short tutorial: [http://www.jawoollam.com/tutorial_1.html tutorial] | |||
** Second watch our training video: [https://www.youtube.com/watch?v=EC-oyRhKr0A Training Video] | |||
** To get more understanding - short intro from ''Quantum Design - Europe'': [https://qd-europe.com/dk/en/product/short-introduction-ellipsometry/] - ''optional'' | |||
*[[/advanced ellipsometry|Examples of advanced use of the ellipsometer]] | |||
===A rough overview of the performance of the Ellipsometers=== | ===A rough overview of the performance of the Ellipsometers=== | ||
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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | ||
|style="background:WhiteSmoke; color:black"|<b>Ellipsometer VASE</b> | |style="background:WhiteSmoke; color:black"|<b>Ellipsometer VASE (M2000XI)</b> | ||
|style="background:WhiteSmoke; color:black"|<b>Ellipsometer M-2000V</b> | |style="background:WhiteSmoke; color:black"|<b>Ellipsometer M-2000V</b> | ||
|- | |- | ||
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==Filmtek 4000== | ==Filmtek 4000== | ||
[[image:Filmtek.JPG|275x275px|right|thumb|FilmTek 4000: positioned in cleanroom | {{CC-bghe2}} | ||
[[image:Filmtek.JPG|275x275px|right|thumb|FilmTek 4000: positioned in cleanroom A-1, {{photo1}}]] | |||
FilmTek 4000 is a computerized film thickness measurement and material characterization system. This system combines fiber-optic spectrophotometry with advanced material modeling software to provide an affordable and reliable tool for the simultaneous measurement of film thickness, index of refraction, and extinction coefficient | FilmTek 4000 is a computerized film thickness measurement and material characterization system. This system combines fiber-optic spectrophotometry with advanced material modeling software to provide an affordable and reliable tool for the simultaneous measurement of film thickness, index of refraction, and extinction coefficient | ||
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'''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:''' | '''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:''' | ||
[http://labmanager | [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=169 FilmTek in LabManager] | ||
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==F10-RT reflectometer, transmitance, film thickness measurements | <!-- | ||
[[image:F10-RT.JPG|275x275px|right|thumb|F10-RT: positioned in | ==F10-RT reflectometer, transmitance, film thickness measurements == | ||
[[image:F10-RT.JPG|275x275px|right|thumb|F10-RT: positioned in basement project lab]] | |||
F10-RT is a combined reflectance and transmittance measurement system that can also use the reflectance measurements to get the film thickness of transparent thin films. This system combines fiber-optic spectrophotometry with material modeling software to provide an affordable tool for the measurement of reflectance, transmitance and film thickness. | F10-RT is a combined reflectance and transmittance measurement system that can also use the reflectance measurements to get the film thickness of transparent thin films. This system combines fiber-optic spectrophotometry with material modeling software to provide an affordable tool for the measurement of reflectance, transmitance and film thickness. | ||
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'''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:''' | '''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:''' | ||
[http://labmanager | [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=466 F10-RT in LabManager] | ||
<br clear="all" /> | <br clear="all" /> | ||
===An overview of the performance of the | ===An overview of the performance of the F10-RT=== | ||
{| border="2" cellspacing="0" cellpadding="10" | {| border="2" cellspacing="0" cellpadding="10" | ||
|- | |- | ||
!style="background:silver; color:black;" align="left"|Purpose | !style="background:silver; color:black;" align="left"|Purpose | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"|Reflectance, transmittance and film thickness measurements optically transparent thin films | ||
|style="background:WhiteSmoke; color:black"|[[:File:Filmetrics Datasheet - F10-RT b3M.pdf |See the datasheet here]] | |||
|- | |- | ||
!style="background:silver; color:black" align="left"|Performance | !style="background:silver; color:black" align="left"|Performance | ||
|style="background:LightGrey; color:black"|Thin film materials that can be measured||style="background:WhiteSmoke; color:black"| | |style="background:LightGrey; color:black"|Thin film materials that can be measured||style="background:WhiteSmoke; color:black"| | ||
Any film that is transparent to the light in the given wavelength range | Reflectance: any flat surface larger than 6mm <br> | ||
Transmittance: any flat transparent material larger then 6mm <br> | |||
Thin film thickness: Any film that is transparent to the light in the given wavelength range | |||
ex: | ex: | ||
*Silicon Oxide | *Silicon Oxide | ||
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*SU8 | *SU8 | ||
*Other polymers | *Other polymers | ||
*and many more | *and many more | ||
|- | |- | ||
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|style="background:LightGrey; color:black"|Film thickness range | |style="background:LightGrey; color:black"|Film thickness range | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* | *15 nm to 70 µm (depending of the material) | ||
*min 100nm (to measure n and k) | |||
* | |||
|- | |- | ||
|style="background:silver; color:black"| | |style="background:silver; color:black"| | ||
| style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"|Probe spot size | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* | *6 mm | ||
|- | |- | ||
|style="background:silver; color:black"| | |style="background:silver; color:black"| | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"|Sample orientation | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* | *Face down | ||
|- | |- | ||
!style="background:silver; color:black" align="left"|Process parameter range | !style="background:silver; color:black" align="left"|Process parameter range | ||
|style="background:LightGrey; color:black"|Wavelength range | |style="background:LightGrey; color:black"|Wavelength range | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*380-1050 nm | |||
* | |||
|- | |- | ||
!style="background:silver; color:black" align="left"|Substrates | !style="background:silver; color:black" align="left"|Substrates | ||
|style="background:LightGrey; color:black"|Batch size | |style="background:LightGrey; color:black"|Batch size | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*One sample at a time - all sample larger than | *One sample at a time - all sample larger than a diameter of 6 mm sizes up to 6" | ||
|- | |- | ||
|style="background:silver; color:black"| | |style="background:silver; color:black"| | ||
| style="background:LightGrey; color:black"|Substrate material allowed | | style="background:LightGrey; color:black"|Substrate material allowed | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*In principle all materials | *In principle all materials as long as they do not leave residuals on the system | ||
|- | |- | ||
|} | |} | ||
--> | |||
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Latest revision as of 10:31, 6 September 2024
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Comparison of the methods
For comparison of the methods for measuring optical constants and film thickness, see here: Film thickness and optical constants of optical transparent films
Ellipsometer VASE and Ellipsometer M-2000V
This section is written by Berit Herstrøm @ DTU Nanolab
The ellipsometer VASE is actually a M2000XI-210 ellipsometer from J.A. Woollam Co., Inc.. We call it VASE (Variable Angle Spectroscopic Ellipsometry) because it can do spectroscopic ellipsometry at variable angles.
The ellipsometer M2000V is an in-situ ellipsometer from J.A. Wollam Co., Inc. This dedicated for being used on the Sputter System Lesker instrument or the ALD2 for in-situ measurements. When it is not on any system it is positioned next to the ALD2.
Ellipsometry is a very sensitive characterization technique which can be used to determine thin film layer thicknesses and/or optical constants. It sends in polarized light on the surface at different angles and measures the change in polarization state of the reflected light.
It is especially good for thin films in the thickness range of a few nanometers to a few microns. The layer should be transparent to light in the usable wavelength range for the thickness to be determined. Large roughness (>40nm) and features within the field of view can cause the measurement to fail.
Ellipsometry is an indirect measurement so a model has to be fit to the data in order to obtain the film thickness and optical constants. To learn more about ellipsometry you can take a look at the tutorial provided by the J. A. Woollam Co.
Access to use the CompleteEASE software can be found using Remote Desktop connection to: DTU-8CC0321MFL (you can only log on when you have the user competences in LabManager) or log on to https://remote.dtu.dk. There should be a connection via Citrix to DTU-8CC0321MFL. You will be prompted for user/password.
The user manuals, quality control procedure and results and contact information can be found in LabManager:
LabManager page for Ellipsometer VASE
LabManager page for Ellipsometer M-2000V
More details
- Before training:
- First go through the Woollam short tutorial: tutorial
- Second watch our training video: Training Video
- To get more understanding - short intro from Quantum Design - Europe: [1] - optional
- Examples of advanced use of the ellipsometer
A rough overview of the performance of the Ellipsometers
Equipment | Ellipsometer VASE (M2000XI) | Ellipsometer M-2000V | |
---|---|---|---|
Purpose |
|
| |
Performance | Films that can be examined |
Any film that is transparent to the light in the given wavelength range e.g.:
|
Any film that is transparent to the light in the given wavelength range e.g.:
|
Film thickness range |
|
| |
Process parameter range | Wavelength range |
|
|
Incident angle range |
|
| |
Beam size |
|
| |
Mapping facility |
|
| |
Accessories | Focusing optics |
|
|
Transmission stage |
|
| |
Substrates | Batch size |
|
|
Allowed materials |
|
|
Filmtek 4000
Unless otherwise stated, all content in this section was done by Berit Herstrøm, DTU Nanolab
FilmTek 4000 is a computerized film thickness measurement and material characterization system. This system combines fiber-optic spectrophotometry with advanced material modeling software to provide an affordable and reliable tool for the simultaneous measurement of film thickness, index of refraction, and extinction coefficient
Normal incidence and polarized 70 degree reflection data is collected and used to calculate thickness and index of refraction of the measured film using SCI’s patented Differential Power Spectral Density (DPSD) technique. Absolute reflection data is obtained by comparing sample data to the measured reflection of a known reference sample, typically a silicon wafer with a thermally grown thin oxide (~63 nm) film.
The spectrophotometer scans the sample over a predefined range of wavelengths. The software generates a reflection spectrum based on a previously stored reference scan, and then performs a regression on the unknown parameters to fit the simulated reflection and power spectral density to the observed values. The resulting thin film parameters along with the measured and modeled spectra are then displayed for the user to examine.
The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:
An overview of the performance of the FilmTek
Purpose | Film thickness measurements and optical characterization of optically transparent thin films |
|
---|---|---|
Performance | Thin film materials that can be measured |
Any film that is transparent to the light in the given wavelength range ex:
|
Film thickness range |
| |
Process parameter range | Wavelength range |
|
Substrates | Batch size |
|
Substrate material allowed |
|