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Specific Process Knowledge/Characterization/MicroSpectroPhotometer (Craic 20/30 PV): Difference between revisions

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<gallery caption="Microspectrophotometer." style="float:right" widths="500px" heights="800px" perrow="1">
<gallery caption="Microspectrophotometer." style="float:right" widths="500px" heights="800px" perrow="1">
image:eves_Craic_tegning_sketch.png| Craic 20/30 PV.
image:eves_Craic_tegning_sketch.png|Light path in Craic 20/30 PV.
</gallery>
</gallery>


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==Performance==
==Performance==
* Wavelength range 200 nm to 1698 nm; (In reality, the shortest measurable wavelength is approximately 370 nm, primarily limited by the characteristics of the halogen light source. On the other end, the longest wavelength can be extended to 2100 nm, constrained by the objective of the measurement. Therefore, in practical terms, the achievable measurement wavelength range falls within <b>375-2100 nm</b>.)
* Spectral resolution 0.5 nm for UV/VIS detector, 3.0 nm for NIR detector. (The measured spectra can be stored separately, and the merge window of the two spectra can be customized);
* Two objectives are installed on the system:
  10x quartz objective (wavelength range 220 nm to 2100 nm, NA 0.2, WD 7.4 mm);
  40x quartz objective (wavelength range 240 nm to 2100 nm, NA 0.6, WD 0.36 mm);
* The motorized stage has a movement range of 114 mm by 75 mm, with 0,02 µm step size
* Two spectrometers are installed on the system:
  Detector 1 (CACBS135) UV/VIS 151-1110 nm
  Detector 2 (NQLBN1008) NIR 694-2210 nm




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|-
|-
|style="background:WhiteSmoke; color:black"|<b>Aperture Number</b>
|style="background:WhiteSmoke; color:black"|<b>Camera Field of View (µm)</b>
|style="background:WhiteSmoke; color:black"|<b>Aperture Size (µm)</b>
|style="background:WhiteSmoke; color:black"|<b>Numerical Aperture (N.A.)</b>
|style="background:WhiteSmoke; color:black"|<b>Working Distance (mm)</b>
|style="background:WhiteSmoke; color:black"|<b>Spectral range (nm)</b>
 
|-
|style="background:WhiteSmoke; align="center"  valign="center" color:black"|849 x 710
|style="background:WhiteSmoke; align="center"  valign="center" color:black"|0.2
|style="background:WhiteSmoke; align="center"  valign="center" color:black"|7.4 
|style="background:WhiteSmoke; align="center"  valign="center" color:black"|220-2100
 
|-
|}
 
| align="center" valign="top"|
{| border="2" cellspacing="2" cellpadding="5"  align="center"
 
|-
!colspan="5" border="none" style="background:silver; color:black;" align="center"| 40X Ultrafluar Objective
 
|-
|style="background:WhiteSmoke; color:black"|<b>Camera Field of View (µm)</b>
|style="background:WhiteSmoke; color:black"|<b>Numerical Aperture (N.A.)</b>
|style="background:WhiteSmoke; color:black"|<b>Numerical Aperture (N.A.)</b>
|style="background:WhiteSmoke; color:black"|<b>Working Distance (mm)</b>
|style="background:WhiteSmoke; color:black"|<b>Working Distance (mm)</b>
|style="background:WhiteSmoke; color:black"|<b>Spectral range (nm)</b>
|style="background:WhiteSmoke; color:black"|<b>Spectral range (nm)</b>
|-
|style="background:WhiteSmoke;  align="center" valign="center" color:black"|210 x 176
|style="background:WhiteSmoke;  align="center" valign="center" color:black"|0.6
|style="background:WhiteSmoke;  align="center" valign="center" color:black"|0.36 
|style="background:WhiteSmoke;  align="center" valign="center" color:black"|240-2100
|-
|}
|-
|}
|}
<br>
<!-- -->
{| border="2" cellspacing="2" cellpadding="2" colspan="10"
|bgcolor="#5CACEE" |'''Aperture sizes for 10x and 40x objectives.'''
|-
|
{|{{table}}
| align="center"|
{| border="2" cellspacing="2" cellpadding="5"  align="center"
|-
!colspan="5" border="none" style="background:silver; color:black;" align="center"| 10X Ultrafluar Objective
|-
|style="background:WhiteSmoke; color:black"|<b>Aperture Number</b>
|style="background:WhiteSmoke; color:black"|<b>Aperture Size (µm)</b>


|-
|-
|<p style="color:red;"><b>1</b></p>
|<p style="color:red;"><b>1</b></p>
|100.2 x 100.2
|100.2 x 100.2
|style="background:WhiteSmoke; align="center" rowspan="6" valign="top | middle" color:black"|0.2
|style="background:WhiteSmoke; align="center" rowspan="6" valign="center" color:black"|7.4 
|style="background:WhiteSmoke; align="center" rowspan="6" valign="center" color:black"|220-2100


|-
|-
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|style="background:WhiteSmoke; color:black"|<b>Aperture Number</b>
|style="background:WhiteSmoke; color:black"|<b>Aperture Number</b>
|style="background:WhiteSmoke; color:black"|<b>Aperture Size (µm)</b>
|style="background:WhiteSmoke; color:black"|<b>Aperture Size (µm)</b>
|style="background:WhiteSmoke; color:black"|<b>Numerical Aperture (N.A.)</b>
|style="background:WhiteSmoke; color:black"|<b>Working Distance (mm)</b>
|style="background:WhiteSmoke; color:black"|<b>Spectral range (nm)</b>


|-
|-
|<p style="color:red;"><b>1</b></p>
|<p style="color:red;"><b>1</b></p>
|24.8 x 24.8
|24.8 x 24.8
|style="background:WhiteSmoke;  align="center" rowspan="6" valign="center" color:black"|0.6
|style="background:WhiteSmoke;  align="center" rowspan="6" valign="center" color:black"|0.36 
|style="background:WhiteSmoke;  align="center" rowspan="6" valign="center" color:black"|240-2100


|-
|-
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|-
|-
|<p style="color:red;"><b>5</b></p>
|<p style="color:red;"><b>5</b></p>
|3 x 3
|3.0 x 3.0


|-
|-
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==Examples==
==Examples==
Objective 10x with the Aperture number 2 (75.3µm x 75.3µm) has been used in all the following examples.  Filter #2 was used for reflection, and #1 for transmittance.
<gallery caption="" widths="1000px" heights="400px" perrow="2">
image:eves_CRAIC_reflectance_Al_reference_counts_20231002.png|Counts from CRAIC Al reference sample. Collect dark and reference procedure result before reflectance measurements.
image:eves_CRAIC_transmittance_FS_CRAIC_reference_counts_20231002.png|Counts from CRAIC quartz reference sample. Collect dark and reference procedure result before transmittance measurements.
</gallery>
===Reflectance measurements===
<gallery caption="" widths="1000px" heights="400px" perrow="1">
image:eves_CRAIC_reflectance_Si_ssp_20231002.png|Reflectance measurement of a Si (ssp, n-doped) wafer. Standard CRAIC Al sample was used as a reference. Objective 10X, Aperture number: 2.
image:eves_CRAIC_reflectance_fused_silica_reference_20231002.png|Reflectance measurement of a fused silica wafer piece. Standard CRAIC Al sample was used as a reference. Objective 10X, Aperture number: 2.
image:eves_CRAIC_reflectance_TiO2_150C_2161cycles_refl_20231002.png|Reflectance measurement of [[Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/TiO2_deposition_using_ALD|TiO2]] deposited at 150&deg;C and 2161 cycles (ca. 100nm) on a ssp Si using [[Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200|ALD]]. Standard CRAIC Al sample was used as a reference. Objective 10X, Aperture number: 2.
image:eves_CRAIC_reflectance_TiO2_350C_2174cycles_refl_20231002.png|Reflectance measurement of [[Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/TiO2_deposition_using_ALD|TiO2]] deposited at 350&deg;C and 2174 cycles (ca. 100nm) on a ssp Si using [[Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200|ALD]]. Standard CRAIC Al sample was used as a reference. Objective 10X, Aperture number: 2.
image:eves_CRAIC_reflectance_AlN_20231002.png|Reflectance measurement of 127 nm AlN deposited on a ssp 6" Si using reactive sputtering method. Standard CRAIC Al sample was used as a reference. Objective 10X, Aperture number: 2.
image:eves_CRAIC_reflectance_Alu_TiO_5x5nm_10bilayer_on_Si_20231002.png|Reflectance measurement of alumina-titania stack of total thickness of 100nm deposited on a ssp Si using [[Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200|ALD]]. Each layer is 5nm, so 10 bilayers in total. Standard CRAIC Al sample was used as a reference. Objective 10X, Aperture number: 2.
image:eves_CRAIC_reflectance_Alu_TiO_5x5nm_10bilayer_on_glass_20231002.png|Reflectance measurement of alumina-titania stack of total thickness of 100nm deposited on a fused silica wafer using [[Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200|ALD]]. Each layer is 5nm, so 10 bilayers in total. Standard CRAIC Al sample was used as a reference. Objective 10X, Aperture number: 2.
image:eves_CRAIC_reflectance_rmal_Au_APTMS_20231002.png|Reflectance measurement of Au layer deposited on fused silica wafer with [[Specific Process Knowledge/Thin film deposition/Deposition_of_Gold#Adhesion_of_Au_on_Si|APTMS as adhesion layer]]. Standard CRAIC Al sample was used as a reference. Objective 10X, Aperture number: 2.
image:eves_CRAIC_reflectance_Au_200nm_20231002.png|Reflectance measurement of 200nm Au layer deposited on ssp Si with 2 nm Cr as adhesion layer. Standard CRAIC Al sample was used as a reference. Objective 10X, Aperture number: 2.
</gallery>
===Transmittance measurements===
<gallery caption="" widths="1000px" heights="400px" perrow="1">
image:eves_CRAIC_transmittance_fused_silica_wafer_20231002.png|Transmittance measurement of a fused silica wafer. Standard CRAIC quartz sample was used as a reference. Objective 10X, Aperture number: 2.
image:eves_CRAIC_transmittance_alu_tio_multi_5x5_10bilayers_20231002.png|Transmittance measurement of an alumina-titania stack of total thickness of 100nm deposited on a fused silica wafer using [[Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200|ALD]]. Each layer is 5nm, so 10 bilayers in total. Standard CRAIC quartz sample was used as a reference. Objective 10X, Aperture number: 2.
image:eves_CRAIC_transmittance_rmal_Au_on_APTMS_20231002.png|Transmittance measurement of Au layer deposited on fused silica wafer with [[Specific Process Knowledge/Thin film deposition/Deposition_of_Gold#Adhesion_of_Au_on_Si|APTMS as adhesion layer]]. Standard CRAIC quartz sample was used as a reference. Objective 10X, Aperture number: 2.
</gallery>
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