Specific Process Knowledge/Characterization/Optical microscope: Difference between revisions

From LabAdviser
Jump to navigation Jump to search
No edit summary
 
(14 intermediate revisions by 4 users not shown)
Line 1: Line 1:
=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Optical_microscope click here]'''  
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Optical_microscope click here]'''  
''This page is written by DTU Nanolab  internal''


[[Category: Equipment|Characterization Optical mi]]
[[Category: Equipment|Characterization Optical mi]]
[[Category: Characterization|Optical mi]]
[[Category: Characterization|Optical mi]]
{| border="1" cellspacing="0" cellpadding="3"
!
! Zeiss Jenatech (strain)
! Nikon SMZ 1500
! Leica S8 APO
! Leitz Medilux
! Zeiss Axiotron 2
! Zeiss Jenatech (particles measurements)
! Noco IR microscope
! Nikon SMZ 1000
! Nikon ME 600
! Nikon Eclipse L200
! Nikon Eclipse L200 (2)
! Nikon ECLIPSE L200N 3
! Nikon ECLIPSE L200N 4
|-
|
|[[image:Zeiss Jenatech strain.jpg|100x100px|thumb|left]]
[[image:Zeiss Jenatech strain_1.jpg|100x100px|thumb|left]]
|[[image:Nikon SMZ 1500.jpg|100x100px|thumb|left]]
|[[image:Leica S8 APO.jpg|100x100px|thumb|left]]
|[[image:Leitz Medilux.jpg|100x100px|thumb|left]]
|[[image:Zeiss Axiotron.jpg|100x100px|thumb|left]]
[[image:Zeiss Axiotron_1.jpg|100x100px|thumb|left]]
|[[image:Zeiss Jenatech particle measurement_2.jpg|100x100px|thumb|left]]
[[image:Zeiss Jenatech particle measurement_1.jpg|100x100px|thumb|left]]
|[[image:Noco IR microscope.jpg|100x100px|thumb|left]]
[[image:Noco IR microscope_1.jpg|100x100px|thumb|left]]
|[[image:Nikon SMZ 1000.jpg|100x100px|thumb|left]]
||[[image:Nikon ME 600.jpg|100x100px|thumb|left]]
[[image:Nikon ME 600_1.jpg|100x100px|thumb|left]]
|[[image:Nikon Eclipse L200.jpg|100x100px|thumb|left]]
[[image:Nikon Eclipse L200_1.jpg|100x100px|thumb|left]]
|[[image:Nikon Eclipse L200 2_1.jpg|100x100px|thumb|left]]
[[image:Nikon Eclipse L200 2.jpg|100x100px|thumb|left]]
|[[File:Nikon Eclipse L 200 3_1.jpg|100x100px|thumb|left]]
|[[File:Nikon Eclipse L 200 4_1.jpg|100x100px|thumb|left]]
|-
|'''Location'''
|Check LabManager
|Check LabManager
|Check LabManager
|Check LabManager
|Check LabManager
|Check LabManager
|Check LabManager
|Check LabManager
|Check LabManager
|Check LabManager
|Check LabManager
|Check LabManager
|Check LabManager
|-
|'''Special features'''
|Wollastron prism
|Stereoscopic microscope
|Stereoscopic microscope
|No
|No
|No
|Infra red (IR) camera
|Stereoscopic microscope
|Wollastron prism
|Motorized stage
[[Specific_Process_Knowledge/Characterization/Optical microscope/Nikon Eclipse L200 auto scan guide|auto scan guide]]
|No
|No
|No
|-
|'''Ocular magnification'''
|10x
|No
|No
|10x
|10x
|10x
|10x
|No
|10x
|10x
|10x
|10x
|10x
|-
|'''Objective magnification'''
|2.5x, 5x, 10x, 20x, 50x
|Zoom 100x
|Zoom 80x
|2.5x, 5x, 10x, 20x, 50x
|5x, 10x, 20x, 50x
|5x, 10x, 20x, 50x, 100x
|2.5x, 5x, 20x, 50x
|Zoom 100x
|5x, 10x, 20x, 50x, 100x
|2.5x, 5x, 10x, 20x, 50x, 100x
|2.5x, 5x, 10x, 20x, 50x, 100x
|2.5x, 5x, 10x, 20x, 50x, 100x
|2.5x, 5x, 10x, 20x, 50x, 100x
|-
|'''Bright field'''
|Yes
|No
|No
|Yes
|Yes
|Yes
|Yes
|No
|Yes
|Yes
|Yes
|Yes
|Yes
|-
|'''Dark field'''
|Yes
|No
|No
|No
|Yes
|Yes
|No
|No
|Yes
|Yes
|Yes
|Yes
|Yes
|-
|'''Polarizer'''
|Yes
|No
|No
|No
|No
|Yes
|No
|No
|Yes
|No
|No
|No
|No
|-
|'''Episcopic light (reflected light)'''
|Yes
|Yes
|Yes
|Yes
|Yes
|Yes
|Yes
|Yes
|Yes
|Yes
|Yes
|Yes
|Yes
|-
|'''Diascopic light (transmitted light)'''
|No
|Yes
|No
|Yes
|Yes
|No
|Yes
|No
|No
|Yes
|Yes
|Yes
|Yes
|-
|'''View with eye'''
|Yes
|Yes
|Yes
|Yes
|Yes
|Yes
|Yes
|Yes
|Yes
|Yes
|Yes
|Yes
|Yes
|-
|'''View on screen (camera)'''
|Yes
|No
|No
|Yes
|Yes
|No
|Yes (IR)
|No
|Yes
|Yes
|Yes
|Yes
|Yes
|-
|'''Measurement option'''
|No
|No
|No
|No
|Yes
|No
|No
|No
|No
|Yes
|Yes
|Yes
|Yes
|-
|}
It is possible to make an automated scanning of a full wafer on the Nikon Eclipse L200 with motorized stage '''[[Specific_Process_Knowledge/Characterization/Optical microscope/Nikon Eclipse L200 auto scan guide|Nikon Eclipse L200 auto scan guide]]'''
=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"
|-
|-style="background:white; color:black; vertical-align:middle; text-align:center;"
!Microscope
!Location
!Responsible Group
!Objectives
!Ocular
!Special features
!Features
!Camera
!Analysis software
|-
|-
|-style="background:LightGrey; color:black; vertical-align:middle; text-align:center;"
!Nikon SMZ 1000[[image:Nikon SMZ 1000.jpg|100x100px|thumb|center]]
|346-901
|Wet chemistry
|Zoom 0.8x - 8x
|10x
|Stereoscopic microscope
|Episcopic
|No
|No
|-
|-
|-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:center;"
!Noco IR[[image:Noco IR microscope.jpg|100x100px|thumb|center]][[image:Noco IR microscope_1.jpg|100x100px|thumb|center]]
|346-901
|Wet chemistry
|
*2.5x
*10x
*20x
*50x
|10x
|IR imaging
|
*Polarizer
*Episcopic
*Diascopic
*Brightfield
|IR camera
|No
|-
|-
|-style="background:LightGrey; color:black; vertical-align:middle; text-align:center;"
!Leica INM100[[image:Nikon SMZ 1000.jpg|100x100px|thumb|center]]
|346-901
|Wet chemistry
|
*2.5x
*5x
*10x
*20x
*50x
|10x
|
|
*Episcopic
*Diascopic
*Brightfield
*Darkfield
|DS-Fi2
|NIS-D
|-
|-
|-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:center;"
!Nikon Eclipse L200 #2[[image:Nikon Eclipse L200 2.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200 2_1.jpg|100x100px|thumb|center]]
|C1
|Thin Film
|
*2.5x
*5x
*10x
*20x
*50x
*100x
|10x
|
|
*Episcopic
*Diascopic
*Brightfield
*Darkfield
|DS-Fi1
|NIS-D
|-
|-
|-style="background:LightGrey; color:black; vertical-align:middle; text-align:center;"
!Zeiss Jenatech[[image:Zeiss Jenatech strain.jpg|100x100px|thumb|center]][[image:Zeiss Jenatech strain_1.jpg|100x100px|thumb|center]]
|C1
|Thin Film
|
*5x
*10x
*20x
*50x
*100x
|10x
|
|
*Polarizer
*Episcopic
*Diascopic
*Brightfield
|No
|No
|-
|-
|-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:center;"
!Nikon Eclipse L200 #1[[image:Nikon Eclipse L200.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200_1.jpg|100x100px|thumb|center]]
|D3
|Thin Film
|
*2.5x
*5x
*10x
*20x
*50x
*100x
|10x
|
*Motorized stage
*'''[[Specific_Process_Knowledge/Characterization/Optical microscope/Nikon Eclipse L200 auto scan guide|Auto scan guide]]'''
|
*Episcopic
*Diascopic
*Brightfield
*Darkfield
|DS-Fi1
|NIS-BR
|-
|-
|-style="background:LightGrey; color:black; vertical-align:middle; text-align:center;"
!Leitz Medilux[[image:Leitz Medilux.jpg|100x100px|thumb|center]]
|D3
|Thin Film
|
*2.5x
*5x
*10x
*20x
*50x
|10x
|
|
*Episcopic
*Diascopic
*Brightfield
|DX40-274FW
|Kappa Control Center
|-
|-
|-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:center;"
!Nikon Eclipse L200N #3[[image:Nikon Eclipse L 200 3_1.jpg|100x100px|thumb|center]]
|E4
|Lithography
|
*2.5x
*5x
*10x
*20x
*50x
*100x
|10x
|
|
*Polarizer
*Episcopic
*Diascopic
*Brightfield
*Darkfield
|
*DS-Fi2
*C-mount, 0.7x relay
|NIS-D
|-
|-
|-style="background:LightGrey; color:black; vertical-align:middle; text-align:center;"
!Nikon Eclipse L200N #4[[image:Nikon Eclipse L 200 4_1.jpg|100x100px|thumb|center]]
|E5
|Lithography
|
*2.5x
*5x
*10x
*20x
*50x
*100x
|10x
|
|
*Polarizer
*Episcopic
*Diascopic
*Brightfield
*Darkfield
|
*DS-Fi2
*C-mount, 0.7x relay
|NIS-D
|-
|-
|-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:center;"
!Nikon ME 600[[image:Nikon ME 600.jpg|100x100px|thumb|center]][[image:Nikon ME 600_1.jpg|100x100px|thumb|center]]
|F1
|Thin Film
|
*5x
*10x
*20x
*50x
*100x
|10x
|
|
*Polarizer
*Episcopic
*Brightfield
*Darkfield
|DS-Fi2
|NIS-D
|-
|-
|-style="background:LightGrey; color:black; vertical-align:middle; text-align:center;"
!Leica S8 APO[[image:Leica S8 APO.jpg|100x100px|thumb|center]]
|F2
|Thin Film
|Zoom 1x - 8x
|10x
|Stereoscopic microscope
|Episcopic
|No
|No
|-
|-
|-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:center;"
!Zeiss Axiotron[[image:Zeiss Axiotron.jpg|100x100px|thumb|center]][[image:Zeiss Axiotron_1.jpg|100x100px|thumb|center]]
|F3
|Lithography
|
*5x
*10x
*20x
*50x
|10x
|
|
*Episcopic
*Diascopic
*Brightfield
*Darkfield
|Infinity X
|DeltaPix
|-
|}
<br clear="all" />
=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=


{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"  
Line 516: Line 13:
!Noco IR
!Noco IR
!Leica INM 100
!Leica INM 100
!Nikon Eclipse L200 #2
!Zeiss Jenatech
!Zeiss Jenatech
!Nikon Eclipse L200 #1
!Nikon Eclipse L200 #1
!Leitz Medilux
!Nikon Eclipse L200 #2
!Nikon Eclipse L200N #3
!Nikon Eclipse L200N #3
!Nikon Eclipse L200N #4
!Nikon Eclipse L200N #4
Line 532: Line 28:
|[[image:Nikon SMZ 1000.jpg|100x100px|thumb|center]]
|[[image:Nikon SMZ 1000.jpg|100x100px|thumb|center]]
|[[image:Noco IR microscope.jpg|100x100px|thumb|center]][[image:Noco IR microscope_1.jpg|100x100px|thumb|center]]
|[[image:Noco IR microscope.jpg|100x100px|thumb|center]][[image:Noco IR microscope_1.jpg|100x100px|thumb|center]]
|[[image:Nikon SMZ 1000.jpg|100x100px|thumb|center]]
|[[image:LeicaINM100.jpg|100x100px|thumb|center]]
|[[image:Nikon Eclipse L200 2.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200 2_1.jpg|100x100px|thumb|center]]
|[[image:Zeiss Jenatech strain.jpg|100x100px|thumb|center]][[image:Zeiss Jenatech strain_1.jpg|100x100px|thumb|center]]
|[[image:Zeiss Jenatech strain.jpg|100x100px|thumb|center]][[image:Zeiss Jenatech strain_1.jpg|100x100px|thumb|center]]
|[[image:Nikon Eclipse L200.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200_1.jpg|100x100px|thumb|center]]
|[[image:Nikon Eclipse L200.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200_1.jpg|100x100px|thumb|center]]
|[[image:Leitz Medilux.jpg|100x100px|thumb|center]]
|[[image:Nikon Eclipse L200 2.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200 2_1.jpg|100x100px|thumb|center]]
|[[image:Nikon Eclipse L 200 3_1.jpg|100x100px|thumb|center]]
|[[image:Nikon Eclipse L 200 3_1.jpg|100x100px|thumb|center]]
|[[image:Nikon Eclipse L 200 4_1.jpg|100x100px|thumb|center]]
|[[image:Nikon Eclipse L 200 4_1.jpg|100x100px|thumb|center]]
Line 546: Line 41:
|-
|-
|-style="background:LightGrey; color:black; vertical-align:middle; text-align:left;"
|-style="background:LightGrey; color:black; vertical-align:middle; text-align:left;"
|Location
!Location
|346-901
|346-901
|346-901
|346-901
|346-901
|346-901
|C1
|cleanroom A1
|C1
|cleanroom D3
|D3
|cleanroom F3
|D3
|cleanroom E4
|E4
|cleanroom E5
|E5
|cleanroom F1
|F1
|cleanroom Cx1
|F2
|cleanroom D3
|F3
|-
|-


|-
|-
|-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:left;"
|-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:left;"
|Responsible group
!Responsible group
|Wet chemistry
|Wet chemistry
|Wet chemistry
|Wet chemistry
|Wet chemistry
|Wet chemistry
|Thin Film
|Thin Film
|Thin Film
|Thin Film
|Lithography
|Lithography
|Lithography
|Lithography
|Thin Film
|Lithography
|Thin Film
|Lithography
|Lithography
|Lithography
|Lithography
|Lithography
|Lithography
|-
|-
Line 580: Line 73:
|-
|-
|-style="background:LightGrey; color:black; vertical-align:middle; text-align:left;"
|-style="background:LightGrey; color:black; vertical-align:middle; text-align:left;"
|Objectives
!Objectives
|Zoom 0.8x - 8x
|Zoom 0.8x - 8x
|
|
Line 594: Line 87:
*50x
*50x
|
|
*2.5x
*5x
*5x
*10x
*10x
Line 601: Line 93:
*100x
*100x
|
|
*2.5x
*5x
*5x
*10x
*10x
*20x
*20x
*50x
*50x
*100x
|
|
*2.5x
*2.5x
Line 613: Line 105:
*50x
*50x
*100x
*100x
|
*2.5x
*5x
*10x
*20x
*50x
|
|
*2.5x
*2.5x
Line 649: Line 135:
|-
|-
|-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:left;"
|-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:left;"
|Ocular
!Ocular
|10x
|10x
|10x
|10x
|10x
Line 666: Line 151:
|-
|-
|-style="background:LightGrey; color:black; vertical-align:middle; text-align:left;"
|-style="background:LightGrey; color:black; vertical-align:middle; text-align:left;"
|Special features
!Special features
|Stereoscopic microscope
|Stereoscopic microscope
|IR imaging
|IR imaging
|
|
|
|
|
Line 685: Line 169:
|-
|-
|-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:left;"
|-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:left;"
|Features
!Contrast mechanisms
|
*Brightfield
|
*Polarizer
*Brightfield
|
|
*Episcopic
*Brightfield
*Darkfield
|
|
*Polarizer
*Polarizer
*Episcopic
*Diascopic
*Brightfield
*Brightfield
|
|
*Episcopic
*Diascopic
*Brightfield
*Brightfield
*Darkfield
*Darkfield
|
|
*Episcopic
*Diascopic
*Brightfield
*Brightfield
*Darkfield
*Darkfield
|
|
*Polarizer
*Polarizer
*Brightfield
*Darkfield
|
*Polarizer
*Brightfield
*Darkfield
|
*Polarizer
*Brightfield
*Darkfield
|
*Brightfield
|
*Brightfield
*Darkfield
|-
|-
|-style="background:LightGrey; color:black; vertical-align:middle; text-align:left;"
!Illumination modes
|
*Episcopic
|
*Episcopic
*Diascopic
|
*Episcopic
*Diascopic
|
*Episcopic
*Episcopic
*Diascopic
*Diascopic
*Brightfield
|
|
*Episcopic
*Episcopic
*Diascopic
*Diascopic
*Brightfield
*Darkfield
|
|
*Episcopic
*Episcopic
*Diascopic
*Diascopic
*Brightfield
|
|
*Polarizer
*Episcopic
*Episcopic
*Diascopic
*Diascopic
*Brightfield
*Darkfield
|
|
*Polarizer
*Episcopic
*Episcopic
*Diascopic
*Diascopic
*Brightfield
*Darkfield
|
|
*Polarizer
*Episcopic
*Episcopic
*Brightfield
*Darkfield
|
|
*Episcopic
*Episcopic
Line 739: Line 239:
*Episcopic
*Episcopic
*Diascopic
*Diascopic
*Brightfield
*Darkfield
|-
|-


|-
|-
|-style="background:LightGrey; color:black; vertical-align:middle; text-align:left;"
|-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:left;"
|Camera
!Camera
|None
|None
|IR camera
|IR camera
|DS-Fi2
|DS-Fi2
|None
|DS-Fi1
|DS-Fi1
|None
|DS-Fi1
|DS-Fi1
|DX40-274FW
|
|
*DS-Fi2
*DS-Fi2
Line 765: Line 262:


|-
|-
|-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:left;"
|-style="background:LightGrey; color:black; vertical-align:middle; text-align:left;"
|Analysis software
!Analysis software
|None
|None
|None
|None
|NIS-D
|NIS-D
|NIS-D
|None
|None
|NIS-BR
|NIS-BR
|Kappa Control Center
|NIS-D
|NIS-D
|NIS-D
|NIS-D
|NIS-D
Line 784: Line 280:


<br clear="all" />
<br clear="all" />
There are also two optical microscopes in building 451, a stereo microscope and a transmission microscope, that were both previously located in Packlab. Please ask staff / the BioMic group for details.

Latest revision as of 12:35, 7 November 2023

Feedback to this page: click here

This page is written by DTU Nanolab internal

Nikon SMZ 1000 Noco IR Leica INM 100 Zeiss Jenatech Nikon Eclipse L200 #1 Nikon Eclipse L200 #2 Nikon Eclipse L200N #3 Nikon Eclipse L200N #4 Nikon ME 600 Leica S8 APO Zeiss Axiotron
Nikon SMZ 1000.jpg
Noco IR microscope.jpg
Noco IR microscope 1.jpg
LeicaINM100.jpg
Zeiss Jenatech strain.jpg
Zeiss Jenatech strain 1.jpg
Nikon Eclipse L200.jpg
Nikon Eclipse L200 1.jpg
Nikon Eclipse L200 2.jpg
Nikon Eclipse L200 2 1.jpg
Nikon Eclipse L 200 3 1.jpg
Nikon Eclipse L 200 4 1.jpg
Nikon ME 600.jpg
Nikon ME 600 1.jpg
Leica S8 APO.jpg
Zeiss Axiotron.jpg
Zeiss Axiotron 1.jpg
Location 346-901 346-901 346-901 cleanroom A1 cleanroom D3 cleanroom F3 cleanroom E4 cleanroom E5 cleanroom F1 cleanroom Cx1 cleanroom D3
Responsible group Wet chemistry Wet chemistry Wet chemistry Lithography Lithography Lithography Lithography Lithography Lithography Lithography Lithography
Objectives Zoom 0.8x - 8x
  • 2.5x
  • 10x
  • 20x
  • 50x
  • 2.5x
  • 5x
  • 10x
  • 20x
  • 50x
  • 5x
  • 10x
  • 20x
  • 50x
  • 100x
  • 2.5x
  • 5x
  • 10x
  • 20x
  • 50x
  • 2.5x
  • 5x
  • 10x
  • 20x
  • 50x
  • 100x
  • 2.5x
  • 5x
  • 10x
  • 20x
  • 50x
  • 100x
  • 2.5x
  • 5x
  • 10x
  • 20x
  • 50x
  • 100x
  • 5x
  • 10x
  • 20x
  • 50x
  • 100x
 Zoom 1x - 8x
  • 5x
  • 10x
  • 20x
  • 50x
Ocular 10x 10x 10x 10x 10x 10x 10x 10x 10x 10x 10x
Special features Stereoscopic microscope IR imaging Stereoscopic microscope
Contrast mechanisms
  • Brightfield
  • Polarizer
  • Brightfield
  • Brightfield
  • Darkfield
  • Polarizer
  • Brightfield
  • Brightfield
  • Darkfield
  • Brightfield
  • Darkfield
  • Polarizer
  • Brightfield
  • Darkfield
  • Polarizer
  • Brightfield
  • Darkfield
  • Polarizer
  • Brightfield
  • Darkfield
  • Brightfield
  • Brightfield
  • Darkfield
Illumination modes
  • Episcopic
  • Episcopic
  • Diascopic
  • Episcopic
  • Diascopic
  • Episcopic
  • Diascopic
  • Episcopic
  • Diascopic
  • Episcopic
  • Diascopic
  • Episcopic
  • Diascopic
  • Episcopic
  • Diascopic
  • Episcopic
  • Episcopic
  • Episcopic
  • Diascopic
Camera None IR camera DS-Fi2 None DS-Fi1 DS-Fi1
  • DS-Fi2
  • C-mount, 0.7x relay
  • DS-Fi2
  • C-mount, 0.7x relay
 DS-Fi2 None Infinity X
Analysis software None None NIS-D None NIS-BR NIS-D NIS-D NIS-D NIS-D None DeltaPix


There are also two optical microscopes in building 451, a stereo microscope and a transmission microscope, that were both previously located in Packlab. Please ask staff / the BioMic group for details.

Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Optical_microscope&oldid=48209"