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Fabrication support at DTU Nanolab.
Fabrication support at DTU Nanolab.


If you have questions you can contact us by e-mailing [mailto:fabricationsupport@nanolab.dtu.dk fabricationsupport@nanolab.dtu.dk].  
If you have questions you can contact us by e-mailing [mailto:nanolabsupport@nanolab.dtu.dk nanolabsupport@nanolab.dtu.dk].  
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'''<big>Literature</big>'''
'''<big>Literature</big>'''
* [[media:Beginners guide to mask design using Clewin v1.4.pdf|Beginners guide to Clewin v1.4]]
* [[media:Beginners guide to mask design using Clewin v1.4.pdf|Beginners guide to Clewin v1.4]]
* [[media:L-Edit User Guide.pdf |L-Edit User Guide]]
* L-edit User Guide: find it in the installation folder of the L-edit software.
* Clewin 5 User Guide: find it in the installation folder of the Clewin 5 software.  
* Clewin 5 User Guide: find it in the installation folder of the Clewin 5 software.  



Latest revision as of 15:23, 16 August 2023

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The Mask Design TPT

DTU Nanolab offers a Tool Package Training in Mask Design. The course is for all users who intend to design their own masks for lithography.

For instructions please download the exercise for the design program you want to learn:

Mask Design Training
Schedule
  • Self-study using screen cast videoes demonstrating the use of either CleWin og L-edit.
  • An exercise where you are guided through the design of a mask.
  • All materials are provided below.
  • An optional ½ hour Q&A session with an expert on mask layout. You can make an appointment after finishing the exercise.
Location
  • Anywhere you like. DTU network access required.
Qualified Prerequisites
  • Basic knowledge about micro-lithography
  • Access to a computer where you can install Clewin or L-edit
    • DTU Nanolab provides free access to use Clewin 5 through a network license.
    • If you want to use L-edit you will need a valid license of your own
  • Basic knowledge about micro-fabrication techniques
Preparations

None

Course Responsible

Fabrication support at DTU Nanolab.

If you have questions you can contact us by e-mailing nanolabsupport@nanolab.dtu.dk.

Learning Objectives
  • Get acquainted with either Clewin 5 or L-edit mask design programs
  • construct and manipulate basic shapes (rectangles, polygons, circles etc.)
  • use mask layers and hierarchical mask design
  • choose mask polarity and orientation for different resist types and Front/Back-side alignment
  • select and design appropriate test structures and alignment marks for a process
  • make a chip/wafer layout usable for dicing
  • export the layout to cif or gds files with appropriate layer names
  • make a mask order


Material for the Mask Design course

Literature

  • Beginners guide to Clewin v1.4
  • L-edit User Guide: find it in the installation folder of the L-edit software.
  • Clewin 5 User Guide: find it in the installation folder of the Clewin 5 software.

Training videos

Exercises