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== The Mask Design TPT ==
== The Mask Design TPT ==


DTU Danchip offers a Tool Package Training in Mask Design.
DTU Nanolab offers a Tool Package Training in Mask Design.
The course is for all users who intend to design their own masks for lithography.
The course is for all users who intend to design their own masks for lithography.


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* Basic knowledge about micro-lithography
* Basic knowledge about micro-lithography
* Access to a computer where you can install Clewin or L-edit
* Access to a computer where you can install Clewin or L-edit
** Danchip provide free access to use Clewin 5 through a network license.
** DTU Nanolab provides free access to use Clewin 5 through a network license.
** If you want to use L-edit you will need a valid license of your own
** If you want to use L-edit you will need a valid license of your own
* Basic knowledge about micro-fabrication techniques
* Basic knowledge about micro-fabrication techniques
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!Course Responsible
!Course Responsible
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Customer support at DTU Danchip.
Fabrication support at DTU Nanolab.


If you have questions you can contact us by e-mailing [mailto:danchipsupport@danchip.dtu.dk danchipsupport@danchip.dtu.dk].  
If you have questions you can contact us by e-mailing [mailto:nanolabsupport@nanolab.dtu.dk nanolabsupport@nanolab.dtu.dk].  
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'''<big>Literature</big>'''
'''<big>Literature</big>'''
* [[media:Beginners guide to mask design using Clewin v1.4.pdf|Beginners guide to Clewin v1.4]]
* [[media:Beginners guide to mask design using Clewin v1.4.pdf|Beginners guide to Clewin v1.4]]
* [[media:L-Edit User Guide.pdf |L-Edit User Guide]]
* L-edit User Guide: find it in the installation folder of the L-edit software.
* [[Media:CleWin5UserGuide.pdf| Clewin 5 User Guide]]
* Clewin 5 User Guide: find it in the installation folder of the Clewin 5 software.


* [[Specific Process Knowledge/Pattern Design#CleWin| How to install CleWin]]
* [[Specific Process Knowledge/Pattern Design/CleWin| How to install CleWin]]


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* [[media:TPT- Mask Design - Exercises for Clewin v1.pdf|Exercise for Clewin 5 ]]
* [[media:TPT- Mask Design - Exercises for Clewin v1.pdf|Exercise for Clewin 5 ]]
* [[media:Exercise_Pressure_sensor.cif‎|Mask layout file for Clewin Exercise]] (Right click and Use "save link as...")
* [[media:Exercise_Pressure_sensor.cif‎|Mask layout file for Clewin Exercise]] (Right click and Use "save link as...")
* [[media:Alignment_and_test_structures.cif‎|Alignment and test structures for Clewin Exercise]] (Right click and Use "save link as..."). This file can be open as Library in the exercise file.
* [[media:Alignment_and_test_structures.cif‎|Alignment and test structures for Clewin Exercise]] (Right click and Use "save link as..."). This file can be open as Library in the Clewin exercise file.
* [[media:TPT - Mask Design - Exercises for L-edit v1.pdf |Exercise for L-Edit]]


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Latest revision as of 15:23, 16 August 2023

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The Mask Design TPT

DTU Nanolab offers a Tool Package Training in Mask Design. The course is for all users who intend to design their own masks for lithography.

For instructions please download the exercise for the design program you want to learn:

Mask Design Training
Schedule
  • Self-study using screen cast videoes demonstrating the use of either CleWin og L-edit.
  • An exercise where you are guided through the design of a mask.
  • All materials are provided below.
  • An optional ½ hour Q&A session with an expert on mask layout. You can make an appointment after finishing the exercise.
Location
  • Anywhere you like. DTU network access required.
Qualified Prerequisites
  • Basic knowledge about micro-lithography
  • Access to a computer where you can install Clewin or L-edit
    • DTU Nanolab provides free access to use Clewin 5 through a network license.
    • If you want to use L-edit you will need a valid license of your own
  • Basic knowledge about micro-fabrication techniques
Preparations

None

Course Responsible

Fabrication support at DTU Nanolab.

If you have questions you can contact us by e-mailing nanolabsupport@nanolab.dtu.dk.

Learning Objectives
  • Get acquainted with either Clewin 5 or L-edit mask design programs
  • construct and manipulate basic shapes (rectangles, polygons, circles etc.)
  • use mask layers and hierarchical mask design
  • choose mask polarity and orientation for different resist types and Front/Back-side alignment
  • select and design appropriate test structures and alignment marks for a process
  • make a chip/wafer layout usable for dicing
  • export the layout to cif or gds files with appropriate layer names
  • make a mask order


Material for the Mask Design course

Literature

  • Beginners guide to Clewin v1.4
  • L-edit User Guide: find it in the installation folder of the L-edit software.
  • Clewin 5 User Guide: find it in the installation folder of the Clewin 5 software.

Training videos

Exercises