Specific Process Knowledge/Characterization/XPS: Difference between revisions

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==The XPS tools at DTU Nanolab==
==The XPS tools at DTU Nanolab==
[[image:XPS instrument2.JPG|300x300px|right|thumb|The XPS system placed at DTU Nanolab (room 904, building 346).]]


In the basement under the cleanroom two X-ray Photoelectron Spectroscopy (XPS) systems are installed in room 904. They are both manufactured by Thermofisher and they enable the users to perform elemental and chemical analysis of samples. The [[Specific Process Knowledge/Characterization/XPS/K-Alpha |K-Alpha]] is a base technique instrument providing XPS analysis. The [[Specific Process Knowledge/Characterization/XPS/Nexsa |Nexsa]] is an upgraded version with all options.
[[Image:XPS K-Alpha.jpg |frame|x300px|The K-Alpha from 2007 is one of the first instruments of this type that was produced.{{photo1}} ]]
[[Image:XPS Nexsa.png |frame|x300px|The Nexsa from 2019 is on the surface very similar to the K-Alpha. Its panels, however, hide a whole range of supplementary techniques.{{photo1}} ]]


'''The user manual(s), user APV(s), technical information and contact information are be found in LabManager:'''
<!-- remember to remove the type of documents that are not present -->


<!-- give the link to the equipment info page in LabManager: -->
In the basement under the cleanroom two X-ray Photoelectron Spectroscopy (XPS) systems are installed back-to-back in the center of room 904. They are both manufactured by Thermofisher and they enable the users to perform elemental and chemical analysis of samples. The [[Specific Process Knowledge/Characterization/XPS/K-Alpha |XPS K-Alpha]] is a base technique instrument providing XPS analysis. The [[Specific Process Knowledge/Characterization/XPS/Nexsa |XPS Nexsa]] is an upgraded version with all options.
[http://labmanager.dtu.dk/function.php?module=Machine&view=view&page_id=276  XPS-ThermoScientific in LabManager]
* [[Specific Process Knowledge/Characterization/XPS/K-Alpha|The XPS K-Alpha page]]
* [[Specific Process Knowledge/Characterization/XPS/Nexsa|The XPS Nexsa page]]


==Elemental analysis==
==Elemental analysis==
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*[[Specific Process Knowledge/Characterization/XPS/XPS elemental composition|Elemental analysis]]
*[[Specific Process Knowledge/Characterization/XPS/XPS elemental composition|Elemental analysis]]
*[[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling|Depth profiling]]
*[[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling|Depth profiling]]
*[[/Carbon contamination|Carbon contamination]]
*[[Specific Process Knowledge/Characterization/XPS/Carbon contamination|Carbon contamination]]


*[[Specific Process Knowledge/Characterization/XPS/ExtDocs | Links to external material ]]
*[[Specific Process Knowledge/Characterization/XPS/ExtDocs | Links to external material ]]
*[[Specific Process Knowledge/Characterization/XPS/Training | Links to instruction videos ]]


== Getting access to the XPS ==
== Getting access to the XPS tools==


Click [[Specific Process Knowledge/Characterization/XPS/Access | '''HERE''' ]] to see information on how to get access to the XPS.
Click [[Specific Process Knowledge/Characterization/XPS/Access | '''HERE''' ]] to see information on how to get access to the XPS.
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== Analyzing XPS spectra ==
== Analyzing XPS spectra ==


The analysis of XPS spectra is an art in itself. Click on the link below to find a some examples in which the Avantage software package has been used to extract information from experiments.
The analysis of XPS spectra is an art in itself. It can be done using various software packages available on the internet. In the links below we will focus on two such examples, Avantage and CasaXPS.
 
*[[Specific Process Knowledge/Characterization/XPS/SoftwareInstall|How to access XPS software: Download/install or by access to server]]
*[[Specific Process Knowledge/Characterization/XPS/Processing|Processing XPS data with Avantage]]
*[[Specific Process Knowledge/Characterization/XPS/Export2CasaXPS | Export Avantage data to CasaXPS]]


*[[Specific Process Knowledge/Characterization/XPS/Processing|Processing XPS data]]
==Techniques and option on the XPS tools==


==Equipment performance of XPS-ThermoScientific==
{| border="2" cellspacing="0" cellpadding="1"
|-
!style="background:silver; color:black;" align="left" colspan="2"|Equipment  
!style="background:silver; color:black;" align="left" |[[Specific Process Knowledge/Characterization/XPS/K-Alpha |XPS K-Alpha (Manufactured by Thermofisher)]]
!style="background:silver; color:black;" align="left" |[[Specific Process Knowledge/Characterization/XPS/Nexsa |XPS Nexsa (Manufactured by Thermofisher)]]
|-
!style="background:silver; color:black;" align="left" rowspan="2"|Purpose
|style="background:LightGrey; color:black"|Main
|style="background:WhiteSmoke; color:black"| XPS analysis using monochromated Al-Kα radiation at 1486.6 eV
|style="background:WhiteSmoke; color:black"| XPS analysis using monochromated Al-Kα radiation at 1486.6 eV
|-


{| border="2" cellspacing="0" cellpadding="1" |-
|style="background:LightGrey; color:black"|Alternative/complementary
!style="background:silver; color:black;" align="left"|Purpose
|style="background:LightGrey; color:black"|Chemical analysis
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
* [[Specific Process Knowledge/Characterization/XPS/XPS elemental composition|Probing elemental composition]]
* Work function measurements
* [[Specific Process Knowledge/Characterization/XPS/XPS Chemical states |Chemical state identification]]
|style="background:WhiteSmoke; color:black"|
* Non destructive technique
* Work function measurements
* Surface sensitive
* [[Specific Process Knowledge/Characterization/XPS/UPS technique| Ultraviolet Photoelectron Spectroscopy (UPS) with He I and He II UV source]]
* [[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling|Depth profiling]] possible by ion beam etch of sample
* [[Specific Process Knowledge/Characterization/XPS/ISS|Ion Scattering Spectroscopy or ISS]]
* [[Specific Process Knowledge/Characterization/XPS/REELS|Reflected Electron Energy Loss Spectroscopy or REELS]]
* Angular Resolved Ultraviolet Photoelectron Spectroscopy (ARUPS)
* [[Specific Process Knowledge/Characterization/XPS/Raman|Raman spectroscopy]]
|-
|-
!rowspan="5" style="background:silver; color:black" align="left"| Performance
!rowspan="5" style="background:silver; color:black" align="left"| Performance
|style="background:LightGrey; color:black"|Spot size
|style="background:LightGrey; color:black"|Spot size
|style="background:WhiteSmoke; color:black"|Can be set between 30µm - 400µm
|style="background:WhiteSmoke; color:black"|XPS: 30µm - 400µm
|style="background:WhiteSmoke; color:black"|
* XPS: 10µm - 400µm
* Raman: > 15 µm
|-
|-
|style="background:LightGrey; color:black"|Probing depth
|style="background:LightGrey; color:black"|Pass energy
|style="background:WhiteSmoke; color:black"|Depending on probed element. Max probe depth lies within 10-200 Å.
|style="background:WhiteSmoke; color:black"|10-400 eV
|style="background:WhiteSmoke; color:black"|10-400 eV (XPS and ISS)
|-
|-
|style="background:LightGrey; color:black"|Resolution
|style="background:LightGrey; color:black"|Analysis modes
|style="background:WhiteSmoke; color:black"|Dependent on probed elements. Concentrations down to about 0,5 atomic % can in some cases be detected.
|style="background:WhiteSmoke; color:black"|Scanned and snapshot
|style="background:WhiteSmoke; color:black"|Scanned, snapshot and SnapMap
|-
|-
|style="background:LightGrey; color:black"|Charge compensation  
|style="background:LightGrey; color:black"|Charge compensation  
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"| Flood gun to be used for charge compensation of non conductive samples only
Flood gun can be used for charge compensation of non conductive samples
|style="background:WhiteSmoke; color:black"| Flood gun to be used for charge compensation of non conductive samples and for source of low energy electrons (REELS)
|-
|-
|style="background:LightGrey; color:black"|Finding structures
|style="background:LightGrey; color:black"|Depth profiles
|style="background:WhiteSmoke; color:black"|Choose measuring spot from camera image (magnified)
|style="background:WhiteSmoke; color:black"|Depth profiles with single Ar ion bombardment
* Monoatomic energy range 200-3000 eV
|style="background:WhiteSmoke; color:black"|Depth profiles with MonoAtomic and Gas Cluster Ion Source ([[Media:MAGCIS.pdf |MAGCIS]])
* Monoatomic energy range 200-4000 eV
* Cluster mode energy range: 2-8 keV
*Cluster size range: 75-2000 atoms
|-
|-
!rowspan="2" style="background:silver; color:black" align="left"|Substrates / Samples
|style="background:LightGrey; color:black"|Sample holder size
|style="background:WhiteSmoke; color:black"| Maximum 60x60 mm
|style="background:WhiteSmoke; color:black"| Maximum 60x60 mm
|-
|-
|-
| style="background:LightGrey; color:black"|Sample height
!rowspan="2" style="background:silver; color:black" align="left"|Depth profiling
|style="background:WhiteSmoke; color:black"| Maximum 20 mm
|style="background:LightGrey; color:black"|Purpose
|style="background:WhiteSmoke; color:black"| Maximum 20 mm
|style="background:WhiteSmoke; color:black"|With ion beam etch the top layer of the material can be removed, to do a depth profiling
|-
|style="background:LightGrey; color:black"|Ion beam size
|style="background:WhiteSmoke; color:black"| About 3x1 mm
 
|-
!rowspan="2" style="background:silver; color:black" align="left"|Substrates
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
Maximum 60x60 mm
|-
| style="background:LightGrey; color:black"|Substrate thickness
|style="background:WhiteSmoke; color:black"|
Maximum height about 20 mm
|-  
|-  
|}
|}

Latest revision as of 15:25, 8 May 2023

Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.

All links to Kemibrug (SDS) and Labmanager Including APV and QC requires login.

Feedback to this page: click here

Unless otherwise stated, all content on this page was created by Jonas Michael-Lindhard, DTU Nanolab

The XPS tools at DTU Nanolab

The K-Alpha from 2007 is one of the first instruments of this type that was produced.Photo: DTU Nanolab internal
The Nexsa from 2019 is on the surface very similar to the K-Alpha. Its panels, however, hide a whole range of supplementary techniques.Photo: DTU Nanolab internal


In the basement under the cleanroom two X-ray Photoelectron Spectroscopy (XPS) systems are installed back-to-back in the center of room 904. They are both manufactured by Thermofisher and they enable the users to perform elemental and chemical analysis of samples. The XPS K-Alpha is a base technique instrument providing XPS analysis. The XPS Nexsa is an upgraded version with all options.

Elemental analysis

The XPS instrument enables elemental analysis, chemical state analysis on the sample surface or deeper down by a depth profiling. A comparison about techniques and instruments used for elemental analysis at DTU Nanolab can be found on the page Element analysis.

More about the different possibilities of the XPS instrument is found here:

Getting access to the XPS tools

Click HERE to see information on how to get access to the XPS.

Analyzing XPS spectra

The analysis of XPS spectra is an art in itself. It can be done using various software packages available on the internet. In the links below we will focus on two such examples, Avantage and CasaXPS.

Techniques and option on the XPS tools

Equipment XPS K-Alpha (Manufactured by Thermofisher) XPS Nexsa (Manufactured by Thermofisher)
Purpose Main XPS analysis using monochromated Al-Kα radiation at 1486.6 eV XPS analysis using monochromated Al-Kα radiation at 1486.6 eV
Alternative/complementary
  • Work function measurements
Performance Spot size XPS: 30µm - 400µm
  • XPS: 10µm - 400µm
  • Raman: > 15 µm
Pass energy 10-400 eV 10-400 eV (XPS and ISS)
Analysis modes Scanned and snapshot Scanned, snapshot and SnapMap
Charge compensation Flood gun to be used for charge compensation of non conductive samples only Flood gun to be used for charge compensation of non conductive samples and for source of low energy electrons (REELS)
Depth profiles Depth profiles with single Ar ion bombardment
  • Monoatomic energy range 200-3000 eV
 Depth profiles with MonoAtomic and Gas Cluster Ion Source (MAGCIS)
  • Monoatomic energy range 200-4000 eV
  • Cluster mode energy range: 2-8 keV
  • Cluster size range: 75-2000 atoms
Substrates / Samples Sample holder size Maximum 60x60 mm Maximum 60x60 mm
Sample height Maximum 20 mm Maximum 20 mm
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