Specific Process Knowledge/Etch/Wet Chromium Etch: Difference between revisions
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'''Feedback to this page''': '''[mailto:wetchemistry@ | '''Feedback to this page''': '''[mailto:wetchemistry@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Wet_Chrominum_Etch click here]''' | ||
'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.''' | |||
'''All links to Kemibrug (SDS) and Labmanager Including APV requires login.''' | |||
'''All measurements on this page has been made by Nanolab staff.''' | |||
[[Category: Equipment|Etch Wet Chromium]] | [[Category: Equipment|Etch Wet Chromium]] | ||
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==Wet etching of Chromium== | ==Wet etching of Chromium== | ||
[[Image: | [[Image:Fumehood1-2.jpg|300x300px|thumb|Fume hood 01 or 02 (for acids and bases) in cleanroom D-3 can be used for wet chromium etching.]] | ||
Wet etching of chromium at | Wet etching of chromium at DTU Nanolab is done making your own set up in a beaker in a fume hood - preferably in D-3. You can see the APV [http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 here]. | ||
We | We use the following solution to etch chromium: | ||
# Commercial chromium etch (Chrome Etch 18). You can see the KBA [ | # Commercial chromium etch (Chrome Etch 18). You can see the KBA (needs login) [https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhESk5HTklNVGQlYzIlODclN2N2JWMyJTgzJTdlJWMyJTg4diVjMiU4OSU3ZSVjMiU4NCVjMiU4MyVjMiU4OCU1ZVlSSQ==#K here] | ||
The etch rate depends on the level of surface oxidation of the chromium metal, but the standard procedure (etch at room temperature: ~22°C) the Etch rate is around 150 nm/min. | |||
Normally the etch is reused, but if you need to dispose it, collect it in a bottle marked O waste. | |||
===Overview of the chromium etch process=== | |||
== | |||
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" | {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" | ||
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! | ! | ||
! Chromium etch 1 | ! Chromium etch 1 | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!General description | !General description | ||
| | | | ||
Etch of chromium | Etch of chromium | ||
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|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
!Link to safety APV and KBA | !Link to safety APV and KBA | ||
|[http://labmanager | |[http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 see fumehood APV/manual here]. | ||
[ | [https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhESk5HTklNVGQlYzIlODclN2N2JWMyJTgzJTdlJWMyJTg4diVjMiU4OSU3ZSVjMiU4NCVjMiU4MyVjMiU4OCU1ZVlSSQ==#K see Chrome Etch 18 KBA here] | ||
|- | |- | ||
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!Chemical solution | !Chemical solution | ||
|Chrome Etch 18 | |Chrome Etch 18 | ||
|- | |- | ||
| Line 59: | Line 52: | ||
!Process temperature | !Process temperature | ||
|Room temperature | |Room temperature | ||
|- | |- | ||
| Line 66: | Line 57: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!Possible masking materials | !Possible masking materials | ||
|Photoresist (1.5 µm AZ5214E) | |Photoresist (1.5 µm AZ5214E) | ||
|- | |- | ||
| Line 72: | Line 62: | ||
|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
!Etch rate | !Etch rate | ||
|~ | |~ 150 nm/min at 22°C | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!Batch size | !Batch size | ||
|1-7 4" wafers at a time | |1-7 4" wafers at a time | ||
|- | |- | ||
| Line 85: | Line 73: | ||
!Size of substrate | !Size of substrate | ||
|Any size and number that can go inside the beaker in use | |Any size and number that can go inside the beaker in use | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!Allowed materials | !Allowed materials | ||
|No restrictions. | |No restrictions. | ||
Make a note on the beaker of which materials have been processed. | Make a note on the beaker of which materials have been processed. | ||
|- | |- | ||
|} | |} | ||
Latest revision as of 14:32, 17 February 2023
Feedback to this page: click here
Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.
All links to Kemibrug (SDS) and Labmanager Including APV requires login.
All measurements on this page has been made by Nanolab staff.
Wet etching of Chromium
Wet etching of chromium at DTU Nanolab is done making your own set up in a beaker in a fume hood - preferably in D-3. You can see the APV here.
We use the following solution to etch chromium:
- Commercial chromium etch (Chrome Etch 18). You can see the KBA (needs login) here
The etch rate depends on the level of surface oxidation of the chromium metal, but the standard procedure (etch at room temperature: ~22°C) the Etch rate is around 150 nm/min.
Normally the etch is reused, but if you need to dispose it, collect it in a bottle marked O waste.
Overview of the chromium etch process
| Chromium etch 1 | |
|---|---|
| General description |
Etch of chromium |
| Link to safety APV and KBA | see fumehood APV/manual here. |
| Chemical solution | Chrome Etch 18 |
| Process temperature | Room temperature |
| Possible masking materials | Photoresist (1.5 µm AZ5214E) |
| Etch rate | ~ 150 nm/min at 22°C |
| Batch size | 1-7 4" wafers at a time |
| Size of substrate | Any size and number that can go inside the beaker in use |
| Allowed materials | No restrictions.
Make a note on the beaker of which materials have been processed. |