Specific Process Knowledge/Characterization/XRD

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XRD at DTU Nanolab

We have two X-ray diffraction setups in building 346:

• The XRD SmartLab primarily for thin film analysis inside the cleanroom.
• The XRD Powder for phase analysis of powders outside the cleanroom.

Data analysis

For data analysis, we recommend using Rigaku SmartLab Studio for both thinfilms and basic powder analysis. If more advanced powder analysis is needed a remote desktop with a licens for the Malvern Panalytical software, HighScore is available.

• Installing SmartLab Studio II
• Converting data from XRD Powder to SmartLab Studio II
• Guide for using SmartLab Studio II for data analysis
• Guide for using HighScore Plus for advanced powder data analysis

Comparison of the XRDs at Nanolab

Equipment		XRD SmartLab	XRD Powder
Purpose	Crystal structure analysis and thin film thickness measurement	Phase ID Crystal Size Crystallinity Quality and degree of orientation 3D orientation Latice strain Composition Twist 3D lattice constant Thickness Roughness Density	Phase ID Crystal Size Crystallinity
X-ray generator	Maximum rated output	3 kW	600 W
	Rated tube voltage	20 to 45 kV	40 kV
	Rated tube current	2 to 60 mA	15 mA
	Type	Sealed tube	Sealed tube
	Target	Cu	Cu
	Focus size	0.4 mm x 8 mm (Line/Point)	0.4 mm x 12 mm (Line)
Goniometer	Scanning mode	incident / receiver coupled or independent	incident / receiver coupled
	Goniomenter radius	300 mm	145 mm
	Minimum step size	0.0001° (0.36")	0.001° (3.6")
	Sample stage	χ:-5~+95° φ:0~360° Z:-4~+1 mm X,Y:±50 mm for a 100 mm wafer Rx,Ry:-5~+5°	Fixed with rotation
	Sample size	Diameter: 150 mm Thickness: 0~21 mm	Powders
Optics	Incident side	Cross Beam Optics(CBO) Ge(220)x2 monochromator In-Plane Parallel Slit Collimator (PSC) Soller slit Variable divergence slit	0.04° soller slit Ni and Cu filter Divergence slits Beam mask
	Receiver side	Automatic variable scattering slit Automatic variable receiver slit Parallel slit analysers (PSA) Ge(220)x2 analyser	0.04° soller slit Ni filter
Substrates	Measurement temperature	Room temperature	May be heated in N2 up to 500°C
	Substrate size	up to 150 mm wafers	Only for powders
	Allowed materials	All materials	All materials have to be approved