Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano121: Difference between revisions

Latest revision as of 10:23, 9 August 2022

The nano1.21 recipe

**Recipe nano1.21**
Recipe	Gas	C₄F₈ 75 sccm, SF₆ 38 sccm
	Pressure	4 mTorr, Strike 3 secs @ 15 mTorr
	Power	800 W CP, 50 W PP
	Temperature	-10 degs
	Hardware	100 mm Spacers
	Time	120 secs
Conditions	Run ID	1925
	Conditioning	Sequence: Oxygen clean, MU tests, processes, no oxygen between runs
	Mask	211 nm zep etched down to 74 nm

The results of the nano1.21 recipe
The 30 nm trenches
The 60 nm trenches
The 90 nm trenches
The 120 nm trenches
The 150 nm trenches
File:C4F8 75 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 50 W PP, -10 degs, 120 secs

Nominal trench line width	'	30	60	90	120	150	Avg	Std
Etch rates	nm/min	168	182	185	189	191	183	9
Sidewall angle	degs	91	91	91	91	90	91	0
CD loss	nm/edge	7	-3	-3	-25	-26	-10	15
CD loss foot	nm/edge	12	9	10	-11	1	4	9
Bowing		9	6	4	5	7	6	2
Bottom curvature		-47	-34	-34	-26	-19	-32	10
zep	nm/min						69

@@ Line 1: / Line 1: @@
+<!-- Ok, jmli 2020-0120 -->
+<!-- Page reviewed 9/8-2022 jmli -->
 == The nano1.21 recipe ==
+<!-- revised 1/6-2015 by jmli -->
 {| border="2" cellpadding="2" cellspacing="1"
@@ Line 6: / Line 13: @@
 ! rowspan="6" align="center"| Recipe
 | Gas
-| C<sub>4</sub>F<sub>8</sub> 75 sccm, SF<sub>6</sub> 52 sccm
+| C<sub>4</sub>F<sub>8</sub> 75 sccm, SF<sub>6</sub> 38 sccm
 |-
 | Pressure
@@ Line 31: / Line 38: @@
 |-
 | Mask
-|  nm zep etched down to 6dgh4 nm
+| 211 nm zep etched down to 74 nm
 |-
 |}
-<gallery caption="The results of the nano1.2 recipe" widths="250" heights="200" perrow="3">
+<gallery caption="The results of the nano1.21 recipe" widths="250" heights="200" perrow="3">
 image:WF_2E06_mar23B-030.jpg|The 30 nm trenches
 image:WF_2E06_mar23B-060.jpg|The 60 nm trenches
@@ Line 44: / Line 51: @@
 C4F8 75 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 50 W PP, -10 degs, 120 secs
 </gallery>
+{| {{table}}
+| align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
+| align="center" style="background:#f0f0f0;"|''''''
+| align="center" style="background:#f0f0f0;"|'''30'''
+| align="center" style="background:#f0f0f0;"|'''60'''
+| align="center" style="background:#f0f0f0;"|'''90'''
+| align="center" style="background:#f0f0f0;"|'''120'''
+| align="center" style="background:#f0f0f0;"|'''150'''
+| align="center" style="background:#f0f0f0;"|'''Avg'''
+| align="center" style="background:#f0f0f0;"|'''Std'''
+|-
+| Etch rates||nm/min||168||182||185||189||191||183||9
+|-
+| Sidewall angle||degs||91||91||91||91||90||91||0
+|-
+| CD loss||nm/edge||7||-3||-3||-25||-26||-10||15
+|-
+| CD loss foot||nm/edge||12||9||10||-11||1||4||9
+|-
+| Bowing||||9||6||4||5||7||6||2
+|-
+| Bottom curvature||||-47||-34||-34||-26||-19||-32||10
+|-
+| zep||nm/min||||||||||||69||
+|-
+|
+|}
+<!-- revised -->