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Helios 5 Hydra UX DualBeam

Resolution

Electron beam:
- At optimum WD: 0.7 nm at 1 kV • 1.0 nm at 500 V (ICD)
- At coincident point: 0.6 nm at 15 kV • 1.2 nm at 1 kV

Xe Ion beam resolution at coincident point:
- <20 nm at 30 kV using preferred statistical method
- <10 nm at 30 kV using selective edge method

Attachments

- MultiChem Gas Injection System (GIS) for W and Pt both E and I beams. C deposition E beam only. XeF2 and H2O etching Ion beam only.

- Thermo Scientific EasyLift™ NanoManipulator for precise in situ sample manipulation

- EBSD

- EDS detector

- Integrated plasma cleaner

May have: (need to check)

- Thermo Scientific CryoCleaner Decontamination Device

- WDS

To find the basic instructions for operating the instrument, the reader is referred to the labmanager manual.

@@ Line 12: / Line 12: @@
 =Technical Notes =
+'''Resolution'''
+* Electron beam:
+** At optimum WD: 0.7 nm at 1 kV • 1.0 nm at 500 V (ICD)
+** At coincident point: 0.6 nm at 15 kV • 1.2 nm at 1 kV
+* Xe Ion beam resolution at coincident point:
+** <20 nm at 30 kV using preferred statistical method
+** <10 nm at 30 kV using selective edge method
+'''Attachments'''
+- MultiChem Gas Injection System (GIS) ''for W and Pt both E and I beams. C deposition E beam only. XeF2 and H2O etching Ion beam only.''
+- Thermo Scientific EasyLift™ NanoManipulator for precise in situ sample manipulation
+- EBSD
+- EDS detector
+- Integrated plasma cleaner
+May have: (need to check)
+- Thermo Scientific CryoCleaner Decontamination Device
+- WDS
+To find the basic instructions for operating the instrument, the reader is referred to the labmanager manual.
 =Important Notes=