Specific Process Knowledge/Lithography/PMMA: Difference between revisions

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{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" width="90%"
 
'''Feedback to this page''': '''[mailto:lithography@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/PMMA click here]'''
 
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|-style="background:black; color:white"
|'''Resist'''
|'''Resist'''
|'''Polarity'''
|'''Polarity'''
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|'''Technical reports'''
|'''Technical reports'''
|'''Spinner'''
|'''Spinner'''
|'''Thinner'''
|'''Developer'''
|'''Developer'''
|'''Rinse'''
|'''Rinse'''
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|-
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|-
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|-style="background:White; color:black"
|-style="background:WhiteSmoke; color:black"
|'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR]]'''
|'''[[Specific_Process_Knowledge/Lithography/PMMA|PMMA]]'''
|Positive
|Positive
|[http://www.allresist.com AllResist]
| [http://www.allresist.com AllResist]
|Standard positive resist, very similar to ZEP520.
|We have various types of PMMA in the cleanroom. Please contact [mailto:Lithography@danchip.dtu.dk Lithography] for information.
|[[media:Allresist_CSAR62_English.pdf‎|Allresist_CSAR62_English.pdf‎]],, [[media:CSAR_62_Abstract_Allresist.pdf‎|CSAR_62_Abstract_Allresist.pdf‎]]
| [[media:MSDS PMMA.pdf|MSDS PMMA]], [[media:AR-P631_679.pdf|Processing guidelines]]
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]]
|See table <u>[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|here]] </u>
|XAR-600-546, XAR-600-548, N50, MIBK:IPA
|Anisole
|IPA:H2O (7:3), MIBK:IPA (1:3)
|IPA
|IPA
|AR-600-71, 1165 Remover
|acetone/1165
|[[media:Process_Flow_CSAR.docx‎|Process Flow CSAR.docx‎]]
|
 
|}
|}


<br><br>


== Spin Curves ==
== Spin Curves ==




The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers.  
The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers. Please notice, that the spinning curves were made in 2015.  


Please be aware that I have experienced a somewhat large thickness deviation (5-8 %) depending on the amount of resist applied to the wafer before spin coating.


 
[[File:SpinCurvePMMA.jpg|right|500px]]
<span style="color:#696969">'''Dosepattern has been e-beam exposured and SEM inspected on those wafers marked by silver gray.'''</span>
 
[[File:SpinCurveCSAR.jpg|right|600px]]




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|-
|-
|-style="background:Black; color:White"
|-style="background:Black; color:White"
!colspan="7"|AllResist AR-P 6200 (> 2ml per 4" wafer) spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 09-04-2014. Softbake 5 min @ 150 degC.
!colspan="7"|AllResist AR-P 672.03 (PMMA) (~ 2ml per 4" wafer) spin coated on 'Spin Coater: Manual Standard Resists, E-5, WILTID & TIGRE, 26-10-2015. Softbake 3 min @ 150 degC.
|-
|-


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|-style="background:silver; color:black"
|-style="background:silver; color:black"
!Spin Speed [rpm]
!Spin Speed [rpm]
!Acceleration [1/s2]
!Acceleration [rpm/s]
!Thickness [nm]
!Thickness [nm]
!St Dev
!St Dev
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|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|4000
|2000
|2000
|4000
|95.55
|225.98
|0.55
|0.97
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|3000
|4000
|194.00
|0.6
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|4000
|4000
|169.57
|0.32
|-
|-


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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|5000
|5000
|4000
|2000
|151.47
|85.50
|0.26
|0.92
|-
 
|-
|-style="background:Silver; color:black"
|6000
|4000
|142.38
|0.41
|-
|-


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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|7000
|7000
|4000
|2000
|126.59
|72.79
|0.36
|1.18
|-
|-
|}
|}


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|-
|-
|-style="background:green; color:White"
|-style="background:red; color:White"
!colspan="7"|AllResist CSAR (< 2ml per 4" wafer) on Spin Coater: Manual LabSpin A-5, TIGRE, 16-06-2014. Softbake 2 min @ 150 degC.
!colspan="7"|AllResist AR-P 672.03 (PMMA) diluted 1:1 in Anisole (~ 2ml per 4" wafer) spin coated on 'Spin Coater: Manual Standard Resists, E-5, WILTID & TIGRE, 26-10-2015. Softbake 3 min @ 150 degC.
|-
|-


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|-style="background:silver; color:black" style="text-align:left;"  
|-style="background:silver; color:black" style="text-align:left;"  
!Spin Speed [rpm]
!Spin Speed [rpm]
!Acceleration [1/s2]
!Acceleration [rpm/s]
!Thickness [nm]
!Thickness [nm]
!St Dev
!St Dev
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|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|3000
|2000
|4000
|2000
|201.61
|51.37
|1.20
|0.25
|-
|-


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|4000
|3000
|4000
|2000
|173.89
|41.97
|0.64
|0.24
|-
|-


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|5000
|4000
|4000
|155.91
|2000
|0.65
|36.25
|-
|0.25
 
|}
 
 
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  style="width: 40%"
|-
 
|-
|-style="background:red; color:White"
!colspan="7"|AllResist CSAR 1:1 in anisole (< 2ml per 4" wafer), Spin Coater: Manual LabSpin A-5, TIGRE, 16-06-2014. Softbake 2 min @ 150 degC.
|-
 
|-
|-style="background:silver; color:black" style="text-align:left;"
!Spin Speed [rpm]
!Acceleration [1/s2]
!Thickness [nm]
!St Dev
|-
|-


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|5000
|2000
|2000
|4000
|32.42
|83.48
|0.30
|0.49
|-
|-


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|3000
|6000
|4000
|2000
|67.12
|30.17
|0.41
|0.29
|-
|-


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|4000
|7000
|4000
|2000
|58.64
|28.76
|0.44
|0.43
|-
 
|-
|-style="background:Silver; color:black"
|5000
|4000
|53.13
|0.39
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|6000
|4000
|48.76
|0.38
|-
|-


|}
|}

Latest revision as of 14:11, 20 January 2020

Feedback to this page: click here

Resist Polarity Manufacturer Comments Technical reports Spinner Thinner Developer Rinse Remover Process flows (in docx-format)
PMMA Positive AllResist We have various types of PMMA in the cleanroom. Please contact Lithography for information. MSDS PMMA, Processing guidelines See table here Anisole IPA:H2O (7:3), MIBK:IPA (1:3) IPA acetone/1165




Spin Curves

The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers. Please notice, that the spinning curves were made in 2015.



AllResist AR-P 672.03 (PMMA) (~ 2ml per 4" wafer) spin coated on 'Spin Coater: Manual Standard Resists, E-5, WILTID & TIGRE, 26-10-2015. Softbake 3 min @ 150 degC.
Spin Speed [rpm] Acceleration [rpm/s] Thickness [nm] St Dev
4000 2000 95.55 0.55
5000 2000 85.50 0.92
7000 2000 72.79 1.18


AllResist AR-P 672.03 (PMMA) diluted 1:1 in Anisole (~ 2ml per 4" wafer) spin coated on 'Spin Coater: Manual Standard Resists, E-5, WILTID & TIGRE, 26-10-2015. Softbake 3 min @ 150 degC.
Spin Speed [rpm] Acceleration [rpm/s] Thickness [nm] St Dev
2000 2000 51.37 0.25
3000 2000 41.97 0.24
4000 2000 36.25 0.25
5000 2000 32.42 0.30
6000 2000 30.17 0.29
7000 2000 28.76 0.43
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