Specific Process Knowledge/Characterization/XRD: Difference between revisions
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'''The user manual(s) | '''The user manual(s), user APV(s), technical information, and contact information can be found in LabManager:''' | ||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=428 RIE1 in LabManager] | [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=428 RIE1 in LabManager] | ||
Revision as of 11:51, 9 July 2018
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XRD SmartLab
The Rigaku SmartLab is an advanced XRD for measuring on thin films. All thin films can be measured without fixating the sample, as the system has a so called In-Plane arm.
The user manual(s), user APV(s), technical information, and contact information can be found in LabManager:
Process information
Link to process pages - e.g. one page for each material
Example:
- Etch of silicon using RIE
- Etch of silicon oxide using RIE
- Etch of silicon nitride using RIE
- Etch of photo resist using RIE
Equipment | Equipment 1 | Equipment 2 | |
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Purpose |
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Performance | Response 1 |
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Response 2 |
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Process parameter range | Parameter 1 |
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Parameter 2 |
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Substrates | Batch size |
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Allowed materials |
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