Specific Process Knowledge/Characterization/XRD: Difference between revisions
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== XRD SmartLab == | == XRD SmartLab == | ||
The Rigaku SmartLab is an advanced XRD for measuring on thin films. All thin films can be measured without fixating the sample, as the system has a so called In-Plane arm. | |||
[[image:Cluster1.jpg|200x200px|right|thumb|Image(s) of the equipment(s)]] | [[image:Cluster1.jpg|200x200px|right|thumb|Image(s) of the equipment(s)]] | ||
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<!-- give the link to the equipment info page in LabManager: --> | <!-- give the link to the equipment info page in LabManager: --> | ||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach= | [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=428 RIE1 in LabManager] | ||
== Process information == | == Process information == | ||
Revision as of 12:49, 9 July 2018
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XRD SmartLab
The Rigaku SmartLab is an advanced XRD for measuring on thin films. All thin films can be measured without fixating the sample, as the system has a so called In-Plane arm.
File:Cluster1.jpg
Image(s) of the equipment(s)
The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:
Process information
Link to process pages - e.g. one page for each material
Example:
- Etch of silicon using RIE
- Etch of silicon oxide using RIE
- Etch of silicon nitride using RIE
- Etch of photo resist using RIE
| Equipment | Equipment 1 | Equipment 2 | |
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| Purpose |
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| Performance | Response 1 |
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| Response 2 |
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| Process parameter range | Parameter 1 |
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| Parameter 2 |
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| Substrates | Batch size |
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| Allowed materials |
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