Specific Process Knowledge/Etch/Wet Chromium Etch: Difference between revisions
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==Wet etching of Chromium== | ==Wet etching of Chromium== | ||
[[Image:Fumehood1-2.jpg|300x300px|thumb|Fume hood 01 or 02 (for acids and bases) in cleanroom D-3 can be used for wet chromium etching.]] | [[Image:Fumehood1-2.jpg|300x300px|thumb|Fume hood 01 or 02 (for acids and bases) in cleanroom D-3 can be used for wet chromium etching.]] | ||
Wet etching of chromium at Danchip is done making your own set up in a beaker in a fume hood - preferably in | Wet etching of chromium at Danchip is done making your own set up in a beaker in a fume hood - preferably in D-3. You can see the APV [http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 here]. | ||
We use the following solution to etch chromium: | We use the following solution to etch chromium: | ||
Revision as of 12:56, 27 February 2017
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Wet etching of Chromium
Wet etching of chromium at Danchip is done making your own set up in a beaker in a fume hood - preferably in D-3. You can see the APV here.
We use the following solution to etch chromium:
- Commercial chromium etch (Chrome Etch 18). You can see the KBA here
The etch rate depends on the level of surface oxidation of the chromium metal, but the standard procedure (etch at room temperature: ~22°C) the etch rate is around 150 nm/min.
Overview of the chromium etch process
| Chromium etch 1 | |
|---|---|
| General description |
Etch of chromium |
| Link to safety APV and KBA | see APV here. |
| Chemical solution | Chrome Etch 18 |
| Process temperature | Room temperature |
| Possible masking materials | Photoresist (1.5 µm AZ5214E) |
| Etch rate | ~ 150 nm/min at 22°C |
| Batch size | 1-7 4" wafers at a time |
| Size of substrate | Any size and number that can go inside the beaker in use |
| Allowed materials | No restrictions.
Make a note on the beaker of which materials have been processed. |