Specific Process Knowledge/Etch/Wet Chromium Etch: Difference between revisions

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Wet etching of chromium at Danchip is done making your own set up in a beaker in a fume hood - preferably in cleanroom B-1 or D-3. You can see the APV [http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 here].
Wet etching of chromium at Danchip is done making your own set up in a beaker in a fume hood - preferably in cleanroom B-1 or D-3. You can see the APV [http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 here].


We have two solutions for this:
We use the following solution to etch chromium:


# Commercial chromium etch (Chrome Etch 18). You can see the KBA [http://kemibrug.dk/KBA/CAS/107388/?show_KBA=1&portaldesign=1 here]
# Commercial chromium etch (Chrome Etch 18). You can see the KBA [http://kemibrug.dk/KBA/CAS/107388/?show_KBA=1&portaldesign=1 here]
# HNO<sub>3</sub>:H<sub>2</sub>O:cerisulphate  - 90ml:1200ml:15g
Etch rate are depending on the level of oxidation of the metal.


====How to mix the Chromium etch 2:====
The etch rate depends on the level of surface oxidation of the chromium metal, but the standard procedure (etch at room temperature: ~22°C) the etch rate is around 150 nm/min.
#Take a beaker and add 15g of cerisulphate.
#Add a little water while stirring - make sure all lumps are gone.
#Add water until 600 ml - keep stirring (use magnetic stirring)
#Add 90 ml HNO<sub>3</sub>
#When the cerisulphate is completely dissolved (clear liquid) you can add the other 600 ml of wafer.


 
===Overview of the chromium etch process===
<br clear="all" />
 
===Comparing the two wet chromium etches===
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"  
|-
|-
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!
!
! Chromium etch 1
! Chromium etch 1
! Chromium etch 2
|-  
|-  


|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!General description
!General description
|
Etch of chromium
|
|
Etch of chromium
Etch of chromium
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|[http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 see APV here].  
|[http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 see APV here].  
[http://kemibrug.dk/KBA/CAS/107388/?show_KBA=1&portaldesign=1 see KBA here]
[http://kemibrug.dk/KBA/CAS/107388/?show_KBA=1&portaldesign=1 see KBA here]
|[http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 see APV here]
|-
|-


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!Chemical solution
!Chemical solution
|Chrome Etch 18
|Chrome Etch 18
|HNO<sub>3</sub>:H<sub>2</sub>O:cerisulphate  - 90ml:1200ml:15g
|-
|-


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!Process temperature
!Process temperature
|Room temperature
|Room temperature
|Room Temperature


|-
|-
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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!Possible masking materials
!Possible masking materials
|Photoresist (1.5 µm AZ5214E)
|Photoresist (1.5 µm AZ5214E)
|Photoresist (1.5 µm AZ5214E)
|-
|-
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|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
!Etch rate
!Etch rate
|~ ? nm/min
|~ 150 nm/min at 22°C
|~40-100 nm/min  
|-
|-


|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!Batch size
!Batch size
|1-7 4" wafers at a time
|1-7 4" wafers at a time
|1-7 4" wafers at a time
|-
|-
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!Size of substrate
!Size of substrate
|Any size and number that can go inside the beaker in use   
|Any size and number that can go inside the beaker in use   
|Any size and number that can go inside the beaker in use
|-
|-


|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!Allowed materials
!Allowed materials
|No restrictions.
Make a note on the beaker of which materials have been processed.
|No restrictions.  
|No restrictions.  
Make a note on the beaker of which materials have been processed.
Make a note on the beaker of which materials have been processed.
|-
|-
|}
|}

Revision as of 12:55, 27 February 2017

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Wet etching of Chromium

Fume hood 01 or 02 (for acids and bases) in cleanroom D-3 can be used for wet chromium etching.

Wet etching of chromium at Danchip is done making your own set up in a beaker in a fume hood - preferably in cleanroom B-1 or D-3. You can see the APV here.

We use the following solution to etch chromium:

  1. Commercial chromium etch (Chrome Etch 18). You can see the KBA here

The etch rate depends on the level of surface oxidation of the chromium metal, but the standard procedure (etch at room temperature: ~22°C) the etch rate is around 150 nm/min.

Overview of the chromium etch process

Chromium etch 1
General description

Etch of chromium

Link to safety APV and KBA see APV here.

see KBA here

Chemical solution Chrome Etch 18
Process temperature Room temperature
Possible masking materials Photoresist (1.5 µm AZ5214E)
Etch rate ~ 150 nm/min at 22°C
Batch size 1-7 4" wafers at a time
Size of substrate Any size and number that can go inside the beaker in use
Allowed materials No restrictions.

Make a note on the beaker of which materials have been processed.

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