Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions
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| Line 129: | Line 129: | ||
| 2800 <!-- coil power --> | | 2800 <!-- coil power --> | ||
| 120>>140(1.5s) 45 <!-- platen power --> | | 120>>140(1.5s) 45 <!-- platen power --> | ||
! rowspan="2" | | ! rowspan="2" | New <!-- Showerhead --> | ||
| rowspan="2" |[[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessA | 1]] <!-- link processes --> | | rowspan="2" |[[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessA | 1]] <!-- link processes --> | ||
| rowspan="2" | <!-- keywords --> | | rowspan="2" | <!-- keywords --> | ||
Revision as of 14:49, 16 December 2014
Comparison of continuous processes
| Process | Before | After | |||||
|---|---|---|---|---|---|---|---|
| Name/Type | Description | Wafer ID | Comment | SEM images | Wafer ID | Comment | SEM images |
| Continuous black silicon recipe on blank wafer | 15 mins, -10 degrees, 32 mtorr, 60 sccm SF6, 55 sccm O2, 70 W platen | S004592 | Wafer centre | 
|
S004679 | Wafer centre | 
|
| S004592 | Wafer edge | 
|
S004679 | Wafer edge | 
| ||
| S00XXX | 8" wafer | S00XXX | Wafer centre | File:S00XX centre.jpg | |||
| S00XXXx | Wafer edge | File:S00XXX dge.jpg | S00XXX | Wafer edge | File:S00xxxx edge.jpg | ||
Comparison of switched processes
| Recipe | Name | Temp. | Deposition step | Etch step | Comments | |||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Time | Pres. | C4F8 | SF6 | O2 | Coil | Time | Pres. | C4F8 | SF6 | O2 | Coil | Platen | Showerhead | Runs | Key words | |||
| Process A | Step1 11 cyc | 20 | 4 | 25 | 200 | 0 | 0 | 2000 | 7.0 | 25(1.5s) 90>>150 | 0 | 350(1.5s) 550 | 5 | 2800 | 120>>140(1.5s) 45 | Old | 1 | |
| Step2 44 cyc | 4 | 25 | 200 | 0 | 0 | 2000 | 7.0 | 25(1.5s) 150 | 0 | 350(1.5s) 550 | 5 | 2800 | 140(1.5s) 45 | |||||
| Step1 11 cyc | 20 | 4 | 25 | 200 | 0 | 0 | 2000 | 7.0 | 25(1.5s) 90>>150 | 0 | 350(1.5s) 550 | 5 | 2800 | 120>>140(1.5s) 45 | New | 1 | ||
| Step2 44 cyc | 4 | 25 | 200 | 0 | 0 | 2000 | 7.0 | 25(1.5s) 150 | 0 | 350(1.5s) 550 | 5 | 2800 | 140(1.5s) 45 | |||||
| Recipe description | Name | Temp. | Deposition step | Etch step | Comments | |||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Time | Pres. | C4F8 | SF6 | O2 | Coil | Time | Pres. | C4F8 | SF6 | O2 | Coil | Platen | Showerhead | Runs | Key words | |||
| Polysilicon etch | polySi etch DUV mask | 30 | 2.3 | 10 | 50 | 0 | 0 | 600 | 5.0 | 10 | 20 | 60 | 5 | 400 | 40 | Old | 1 | Slightly over-etching to ensure complete absence of grass |
| polySi etch DUV mask | 30 | 2.3 | 10 | 50 | 0 | 0 | 600 | 5.0 | 10 | 20 | 60 | 5 | 400 | 40 | New | 1 | ||
| Cpoly1 | 30 | 1.2 | 10 | 50 | 0 | 0 | 600 | 5.0 | 10 | 20 | 60 | 5 | 400 | 40 | New | 1 | Very aggressive, unusable | |
| Cpoly2 | 30 | 1.4 | 10 | 50 | 0 | 0 | 600 | 5.0 | 10 | 20 | 60 | 5 | 400 | 40 | New | 1 | ||
| Cpoly3 | 30 | 1.6 | 10 | 50 | 0 | 0 | 600 | 5.0 | 10 | 20 | 60 | 5 | 400 | 40 | New | 1 | ||
| Cpoly4 | 30 | 1.8 | 10 | 50 | 0 | 0 | 600 | 5.0 | 10 | 20 | 60 | 5 | 400 | 40 | New | 1 | ||
| Cpoly5 | 30 | 2.0 | 10 | 50 | 0 | 0 | 600 | 5.0 | 10 | 20 | 60 | 5 | 400 | 40 | New | 1 | ||