Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions

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{| border="1" cellpadding="1" cellspacing="1" style="text-align:center;"
{| border="1" cellpadding="1" cellspacing="1" style="text-align:center;"
|+ '''Process parameters'''
|+ '''Comparison of processes before and after the change of showerhead in December 2014'''
|-
|-
! rowspan="2"| Process
! rowspan="2"| Process
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! Wafer ID
! Wafer ID
! SEM images
! SEM images
! Parameter change
! Comment
! Wafer ID
! Wafer ID
! SEM images
! SEM images
|-
|-
! rowspan="2"| rebe g4-14 black silicon recipe
| S004592
| Centre wafer
| [[file:S004592 centre.jpg |150px|frameless ]]
| S004592
| Centre wafer
| [[file:S004 centre.jpg |150px|frameless ]]
|}
|}

Revision as of 11:01, 4 December 2014

Comparison of processes before and after the change of showerhead in December 2014
Process Before After
Parameter change Wafer ID SEM images Comment Wafer ID SEM images
rebe g4-14 black silicon recipe S004592 Centre wafer S004592 centre.jpg S004592 Centre wafer File:S004 centre.jpg