Sputtering of Ti in Wordentec: Revision history

11 May 2023

• curprev 10:3510:35, 11 May 2023‎ Paphol talk contribs‎ 629 bytes +86‎ No edit summary

11 September 2022

• curprev 17:1217:12, 11 September 2022‎ Eves talk contribs‎ 543 bytes +2‎ →‎Deposition rate

19 March 2020

• curprev 13:4013:40, 19 March 2020‎ Reet talk contribs‎ 541 bytes −34‎ No edit summary
• curprev 13:3913:39, 19 March 2020‎ Reet talk contribs‎ 575 bytes +308‎ →‎Deposition rate

18 March 2020

• curprev 12:2912:29, 18 March 2020‎ Reet talk contribs‎ m 267 bytes +22‎ →‎Deposition rate

25 January 2018

• curprev 08:5808:58, 25 January 2018‎ Rkch talk contribs‎ 245 bytes 0‎ →‎Deposition rate

7 April 2014

• curprev 08:5108:51, 7 April 2014‎ Knil talk contribs‎ 245 bytes −5‎ No edit summary

8 September 2009

• curprev 11:5811:58, 8 September 2009‎ Kn talk contribs‎ 250 bytes +250‎ New page: == Deposition rate == The deposition rate will change with the settings for pressure and effect. '''Pressure <math>1*10^{-2}</math> mbar, Effect 300 W''' The rate is established to b...