Specific Process Knowledge/Wafer cleaning: Revision history

2 February 2023

• curprev 09:4009:40, 2 February 2023‎ Mbec talk contribs‎ 5,207 bytes +224‎ No edit summary

25 January 2021

• curprev 14:3014:30, 25 January 2021‎ Mbec talk contribs‎ 4,983 bytes +1‎ →‎Cleaning of wafers

19 November 2020

• curprev 09:5409:54, 19 November 2020‎ Jehan talk contribs‎ 4,982 bytes −4‎ →‎Items that have been outside the cleanroom
• curprev 09:5309:53, 19 November 2020‎ Jehan talk contribs‎ 4,986 bytes 0‎ →‎Items that have been outside the cleanroom

21 April 2020

• curprev 09:1009:10, 21 April 2020‎ Rkch talk contribs‎ 4,986 bytes +202‎ →‎Comparison of Wafer Cleaning Methods

25 November 2019

• curprev 11:0811:08, 25 November 2019‎ Jmli talk contribs‎ 4,784 bytes 0‎ →‎Items that have been outside the cleanroom
• curprev 11:0711:07, 25 November 2019‎ Jmli talk contribs‎ 4,784 bytes +129‎ No edit summary
• curprev 11:0611:06, 25 November 2019‎ Jmli talk contribs‎ 4,655 bytes −129‎ No edit summary
• curprev 11:0411:04, 25 November 2019‎ Jmli talk contribs‎ 4,784 bytes 0‎ No edit summary

13 November 2018

• curprev 11:2011:20, 13 November 2018‎ Rkch talk contribs‎ 4,784 bytes +88‎ →‎Comparison of Wafer Cleaning Methods

19 June 2018

• curprev 15:3915:39, 19 June 2018‎ Choi talk contribs‎ 4,696 bytes +11‎ →‎Comparison of Wafer Cleaning Methods

19 May 2017

• curprev 13:4913:49, 19 May 2017‎ Choi talk contribs‎ 4,685 bytes +1‎ →‎Wafers that have been in KOH baths (Si Etch 1, 2 and 3), KOH BHF baths or 'Nitride etch: H3PO4' (warm phosphoric acid
• curprev 13:4913:49, 19 May 2017‎ Choi talk contribs‎ 4,684 bytes +121‎ →‎Wafers that have been in the KOH baths, KOH BHF baths or the warm phosphoric acid

18 October 2016

• curprev 13:5913:59, 18 October 2016‎ Jehan talk contribs‎ m 4,563 bytes −1‎ →‎Items that have been outside the cleanroom
• curprev 13:5813:58, 18 October 2016‎ Jehan talk contribs‎ 4,564 bytes +1‎ →‎Items that have been outside the cleanroom
• curprev 13:5713:57, 18 October 2016‎ Jehan talk contribs‎ 4,563 bytes +268‎ No edit summary
• curprev 13:4613:46, 18 October 2016‎ Jehan talk contribs‎ 4,295 bytes +163‎ →‎Items that have been outside the cleanroom

17 October 2014

• curprev 08:1208:12, 17 October 2014‎ Bghe talk contribs‎ 4,132 bytes +30‎ →‎Comparison of Wafer Cleaning Methods

7 March 2014

• curprev 15:5815:58, 7 March 2014‎ Kabi talk contribs‎ 4,102 bytes +2‎ →‎Wafers that go into the high temperature furnaces
• curprev 15:5715:57, 7 March 2014‎ Kabi talk contribs‎ 4,100 bytes −2‎ →‎Wafers that go into the high temperature furnaces
• curprev 15:1215:12, 7 March 2014‎ Bghe talk contribs‎ 4,102 bytes +24‎ →‎Cleaning of wafers
• curprev 15:1015:10, 7 March 2014‎ Bghe talk contribs‎ 4,078 bytes +9‎ →‎Cleaning of wafers
• curprev 15:0215:02, 7 March 2014‎ Bghe talk contribs‎ 4,069 bytes −2‎ →‎Cleaning of wafers
• curprev 15:0115:01, 7 March 2014‎ Bghe talk contribs‎ 4,071 bytes +2‎ →‎Cleaning of wafers
• curprev 15:0015:00, 7 March 2014‎ Bghe talk contribs‎ 4,069 bytes −24‎ →‎Wafers that go into the high temperature furnaces
• curprev 14:5914:59, 7 March 2014‎ Bghe talk contribs‎ 4,093 bytes 0‎ →‎Wafers that go into the high temperature furnaces
• curprev 14:5814:58, 7 March 2014‎ Bghe talk contribs‎ 4,093 bytes −6‎ →‎Cleaning of wafers
• curprev 14:5714:57, 7 March 2014‎ Bghe talk contribs‎ 4,099 bytes +47‎ →‎Cleaning of wafers
• curprev 14:5714:57, 7 March 2014‎ Bghe talk contribs‎ 4,052 bytes +7‎ →‎Cleaning of wafers
• curprev 14:5714:57, 7 March 2014‎ Bghe talk contribs‎ 4,045 bytes +1‎ →‎Cleaning of wafers
• curprev 14:5614:56, 7 March 2014‎ Bghe talk contribs‎ 4,044 bytes +5‎ →‎Cleaning of wafers
• curprev 14:5614:56, 7 March 2014‎ Bghe talk contribs‎ 4,039 bytes +27‎ →‎Cleaning of wafers
• curprev 14:5214:52, 7 March 2014‎ Bghe talk contribs‎ 4,012 bytes +242‎ →‎Cleaning of wafers
• curprev 14:4814:48, 7 March 2014‎ Bghe talk contribs‎ 3,770 bytes +25‎ →‎Cleaning of wafers

4 March 2014

• curprev 15:0815:08, 4 March 2014‎ Kabi talk contribs‎ 3,745 bytes +1‎ →‎Comparison of Wafer Cleaning Methods
• curprev 15:0815:08, 4 March 2014‎ Kabi talk contribs‎ 3,744 bytes −30‎ →‎Comparison of Wafer Cleaning Methods
• curprev 15:0815:08, 4 March 2014‎ Kabi talk contribs‎ 3,774 bytes +3‎ →‎Comparison of Wafer Cleaning Methods
• curprev 15:0715:07, 4 March 2014‎ Kabi talk contribs‎ 3,771 bytes +100‎ →‎Comparison of Wafer Cleaning Methods
• curprev 15:0515:05, 4 March 2014‎ Kabi talk contribs‎ 3,671 bytes +48‎ →‎Comparison of Wafer Cleaning Methods
• curprev 15:0315:03, 4 March 2014‎ Kabi talk contribs‎ 3,623 bytes +26‎ →‎Cleaning of wafers
• curprev 15:0115:01, 4 March 2014‎ Kabi talk contribs‎ 3,597 bytes −1‎ →‎Cleaning of wafers
• curprev 15:0015:00, 4 March 2014‎ Kabi talk contribs‎ 3,598 bytes +5‎ →‎Cleaning of wafers
• curprev 14:5914:59, 4 March 2014‎ Kabi talk contribs‎ 3,593 bytes +4‎ →‎Cleaning of wafers
• curprev 14:5914:59, 4 March 2014‎ Kabi talk contribs‎ 3,589 bytes +1‎ →‎Cleaning of wafers
• curprev 14:5914:59, 4 March 2014‎ Kabi talk contribs‎ 3,588 bytes +67‎ →‎Cleaning of wafers
• curprev 14:5714:57, 4 March 2014‎ Kabi talk contribs‎ 3,521 bytes +838‎ →‎Cleaning of wafers

3 March 2014

• curprev 14:0114:01, 3 March 2014‎ Kabi talk contribs‎ 2,683 bytes 0‎ →‎Comparison of Wafer Cleaning Methods
• curprev 14:0114:01, 3 March 2014‎ Kabi talk contribs‎ 2,683 bytes 0‎ →‎Comparison of Wafer Cleaning Methods
• curprev 14:0114:01, 3 March 2014‎ Kabi talk contribs‎ 2,683 bytes 0‎ →‎Comparison of Wafer Cleaning Methods
• curprev 13:0313:03, 3 March 2014‎ Kabi talk contribs‎ 2,683 bytes +1‎ →‎Cleaning of wafers
• curprev 13:0213:02, 3 March 2014‎ Kabi talk contribs‎ 2,682 bytes 0‎ →‎Cleaning of wafers
• curprev 13:0113:01, 3 March 2014‎ Kabi talk contribs‎ 2,682 bytes +7‎ →‎Cleaning of wafers
• curprev 13:0113:01, 3 March 2014‎ Kabi talk contribs‎ 2,675 bytes −80‎ →‎70px Section under construction
• curprev 13:0013:00, 3 March 2014‎ Kabi talk contribs‎ 2,755 bytes +96‎ →‎Comparison of Wafer Cleaning Methods
• curprev 12:5812:58, 3 March 2014‎ Kabi talk contribs‎ 2,659 bytes 0‎ No edit summary
• curprev 12:5712:57, 3 March 2014‎ Kabi talk contribs‎ 2,659 bytes +23‎ →‎Clean with:
• curprev 11:5611:56, 3 March 2014‎ Kabi talk contribs‎ 2,636 bytes +1‎ →‎Comparison of Wafer Cleaning Methods
• curprev 11:4311:43, 3 March 2014‎ Kabi talk contribs‎ 2,635 bytes +39‎ →‎Comparison of Wafer Cleaning Methods
• curprev 11:2811:28, 3 March 2014‎ Kabi talk contribs‎ 2,596 bytes +68‎ →‎Comparison of Wafer Cleaning Methods
• curprev 11:2111:21, 3 March 2014‎ Kabi talk contribs‎ 2,528 bytes +1,951‎ No edit summary

11 October 2013

• curprev 13:5413:54, 11 October 2013‎ Bghe talk contribs‎ 577 bytes +204‎ No edit summary

11 February 2008

• curprev 12:1212:12, 11 February 2008‎ 192.38.87.73 talk‎ 373 bytes −81‎ No edit summary
• curprev 12:0712:07, 11 February 2008‎ 192.38.87.73 talk‎ 454 bytes −30‎ No edit summary
• curprev 12:0612:06, 11 February 2008‎ 192.38.87.73 talk‎ 484 bytes +1‎ No edit summary

18 October 2007

• curprev 08:2508:25, 18 October 2007‎ BGE talk contribs‎ 483 bytes −50‎ →‎Clean with:

12 October 2007

• curprev 13:2913:29, 12 October 2007‎ BGE talk contribs‎ m 533 bytes 0‎ Wafer cleaning moved to Specific Process Knowledge/Wafer cleaning

4 October 2007

• curprev 16:1316:13, 4 October 2007‎ BGE talk contribs‎ 533 bytes +341‎ No edit summary
• curprev 14:3514:35, 4 October 2007‎ 192.38.87.73 talk‎ 192 bytes −74‎ No edit summary

20 September 2007

• curprev 14:2814:28, 20 September 2007‎ 192.38.87.76 talk‎ 266 bytes +266‎ New page: == Clean with: == *RCA - ''two step process to remove organics and metals'' *7-up - ''piranha etch of wafers and masks - removes organiscs and alkali ions'' *BHF - ''etching of predep gla...