Specific Process Knowledge/Wafer cleaning: Revision history

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7 March 2014

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11 February 2008

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20 September 2007

  • curprev 14:2814:28, 20 September 2007192.38.87.76 talk 266 bytes +266 New page: == Clean with: == *RCA - ''two step process to remove organics and metals'' *7-up - ''piranha etch of wafers and masks - removes organiscs and alkali ions'' *BHF - ''etching of predep gla...
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