Specific Process Knowledge/Thin film deposition/PECVD: Revision history

Jump to navigation Jump to search

Diff selection: Mark the radio buttons of the revisions to compare and hit enter or the button at the bottom.
Legend: (cur) = difference with latest revision, (prev) = difference with preceding revision, m = minor edit.

26 May 2023

24 March 2023

31 January 2023

29 August 2022

16 June 2020

7 January 2020

25 November 2019

27 June 2019

19 June 2018

8 May 2018

3 May 2018

7 March 2017

1 March 2017

20 December 2016

29 November 2016

19 April 2016

24 November 2015

22 June 2015

25 August 2014

6 May 2014

27 January 2014

21 October 2013

16 October 2013

25 October 2010

7 May 2008

13 December 2007

4 December 2007

3 December 2007

22 October 2007

  • curprev 14:4414:44, 22 October 2007192.38.87.76 talk 526 bytes +526 New page: ==PECVD Plasma Enhanced Chemical Vapor Deposition== We have three PECVD's here at DANCHIP. They can all be used to deposit Silicon oxides and Silicon nitrides with or without dopants of Bo...