Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617: Difference between revisions
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(Created page with "AR-P 617 is a positive PMMA based E-beam resist from Allresist. =Spin coating= AR-P 617 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for AR-P 617.06 is provided below. Process parameters are: *Coater: LabSpin 3 *Substrate: 2" Si *Acceleration: 1000 RPM/s Time: 60 s Baking temperature: 200C (setpoint at 222C) Baking time: 120 s") |
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=Spin coating= | =Spin coating= | ||
AR-P 617 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for AR-P 617.06 is provided below. Process parameters are: | AR-P 617 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for AR-P 617.06 is provided below. Process parameters are: | ||
*Date: January 22nd 2024 | |||
*Coater: LabSpin 3 | *Coater: LabSpin 3 | ||
*Substrate: 2" Si | *Substrate: 2" Si | ||
*Acceleration: 1000 RPM/s | *Acceleration: 1000 RPM/s | ||
Time: 60 s | *Time: 60 s | ||
Baking temperature: 200C (setpoint at 222C) | *Baking temperature: 200C (setpoint at 222C) | ||
Baking time: 120 s | *Baking time: 120 s | ||
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AR-P 617.06 spin curve. | |||
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Revision as of 11:48, 22 January 2024
AR-P 617 is a positive PMMA based E-beam resist from Allresist.
Spin coating
AR-P 617 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for AR-P 617.06 is provided below. Process parameters are:
- Date: January 22nd 2024
- Coater: LabSpin 3
- Substrate: 2" Si
- Acceleration: 1000 RPM/s
- Time: 60 s
- Baking temperature: 200C (setpoint at 222C)
- Baking time: 120 s
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AR-P 617.06 spin curve. |