Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617: Revision history

25 April 2024

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13 February 2024

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7 February 2024

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30 January 2024

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28 January 2024

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22 January 2024

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• curprev 11:4811:48, 22 January 2024‎ Thope talk contribs‎ 591 bytes +226‎ →‎Spin coating

• curprev 11:4511:45, 22 January 2024‎ Thope talk contribs‎ 365 bytes +365‎ Created page with "AR-P 617 is a positive PMMA based E-beam resist from Allresist. =Spin coating= AR-P 617 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for AR-P 617.06 is provided below. Process parameters are: *Coater: LabSpin 3 *Substrate: 2" Si *Acceleration: 1000 RPM/s Time: 60 s Baking temperature: 200C (setpoint at 222C) Baking time: 120 s"