Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/tests CHF3+H2: Revision history

Jump to navigation Jump to search

Diff selection: Mark the radio buttons of the revisions to compare and hit enter or the button at the bottom.
Legend: (cur) = difference with latest revision, (prev) = difference with preceding revision, m = minor edit.

29 April 2024

22 April 2024

15 April 2024

20 March 2024

18 March 2024

5 March 2024

14 December 2023

  • curprev 11:4011:40, 14 December 2023Mfarin talk contribs 8,948 bytes +8,948 Created page with "===Recipes and results - <span style="background:#FFD850">CHF<sub>3</sub> tests=== {| border="1" cellspacing="1" cellpadding="1" align="left" ! '''Recipe''' ! '''Recipe parameters''' ! '''Process time''' ! '''Date''' ! '''SEM picture''' ! '''SEM pic w/ no resist''' ! '''Redeposition - top view''' ! '''Profile angles''' ! '''Etch rate in SiO2''' ! '''Etch rate in resist <br> (AZ5214E inverse)''' ! '''Selectivity <br> (SiO2:resist)''' ! '''Etch rate in Si''' |- |- |-sty..."