Information for "Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/More test with CF4/H2, CHF3 and C4F8/H2 - SiO2 etch"
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Basic information
| Display title | Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/More test with CF4/H2, CHF3 and C4F8/H2 - SiO2 etch |
| Default sort key | Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/More test with CF4/H2, CHF3 and C4F8/H2 - SiO2 etch |
| Page length (in bytes) | 12,369 |
| Page ID | 7499 |
| Page content language | en - English |
| Page content model | wikitext |
| Indexing by robots | Allowed |
| Number of redirects to this page | 0 |
| Number of subpages of this page | 0 (0 redirects; 0 non-redirects) |
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| Edit | Allow all users (infinite) |
| Move | Allow all users (infinite) |
Edit history
| Page creator | Mfarin (talk | contribs) |
| Date of page creation | 13:48, 3 October 2023 |
| Latest editor | Mfarin (talk | contribs) |
| Date of latest edit | 11:54, 29 April 2024 |
| Total number of edits | 21 |
| Total number of distinct authors | 1 |
| Recent number of edits (within past 90 days) | 6 |
| Recent number of distinct authors | 1 |