User resist bottles in the cleanroom

We recommend all groups or users to have their own bottle of e-beam resist inside the cleanroom. Please follow the guidelines below.

Find a blue-capped glass bottle in the cupboard next to office 055 in 346 (outside the cleanroom).
Bring the bottle inside gowning; clean it thoroughly on the outside with water or alcohol
Bring the bottle to a fumehood inside the cleanroom; clean the bottle and the lid thoroughly on the inside with the main solvent of your resist, i.e. for CSAR use anisole. If in doubt which solvent your e-beam resist contains, consult the MSDS of the resist found here.
If you need to dilute the resist, find a measurement beaker and clean it thoroughly in same solvent as your own bottle. For CSAR, ZEP, mr EBL, and anisole-based PMMA, you can use the measurement beaker in the box inside the fumehood in E-4.
Let the bottle dry in the fumehood.
Bring the (main) bottle of resist to the fumehood. Carefully unscrew the lid of the resist bottle. If necessary, wipe the thread of the resist bottle before you pour resist into your own bottle; dried resists may sit on the thread and be transferred into your bottle (or worse into the large resist bottle) when pouring.
Clean all bottles on the outside with acetone or IPA, let them fume off in the fumehood. Clean the measurement beaker as well.
Find a label to your resist bottle; bottles without labels will be removed from the cleanroom.
Write name, Lotnumber, group and date on your bottle.

When spin coating e-beam resist, you should use a pipette to transfer resist from your bottle to the substrate. If you pour the resist directly from your bottle, you will leave resist in the thread that will soon dry out and leave particles in the resist. The disposable pipettes need to be thoroughly cleaned with a N2 gun before use (app. 20 s). After some practice, you can obtain particle-free 4" wafers if bottle and pipette (and spin coater) are properly cleaned.

Keep your resist bottles in up-right position, do not tilt or shake them too much, this can spread particles from the sidewall into the resist.