Specific Process Knowledge/Lithography/EBeamLithography/AR-N 7520 New

AR-N 7520 New is a negative resist provided by Allresist. The "New" is important, "AR-N 7520" and "AR-N 7520 New" are not the same resists.

Contrast curve

• Coater: LabSpin 2
• Substrate: 2" Si
• Acceleration: 1000 RPM/s
• Speed: 4000 RPM
• Time: 60 s
• Baking temperature: 85C
• Baking time: 60 s
• Exposure: 100 kV (JEOL 9500)
• Development: AR 300-46 for 90 seconds
• Stopper: DI for 30 seconds + blow dry with nitrogen

AR-N 7520.17 New contrast curve.