Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using AOE
Etching of Silicon Oxide using AOE
Parameter | Si mask | Resist mask |
---|---|---|
Coil Power [W] | 1300 | 1000 |
Platen Power [W] | 500 | 300 |
Platen temperature [oC] | 35 | 0 |
He flow [sccm] | 300 | 174 |
CF flow [sccm] | 18 | 10 |
H2 flow [sccm] | 0 | 8 |
Pressure [mTorr] | 4 | 4 |