Specific Process Knowledge/Etch/DRIE-Pegasus/nanobosch/nanobosch6

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Test run using AZ resist 24/9-2012

Process conditions
Substrate information Wafer C01296.05
Mask Travka50 mask in a few microns of AZ resist
Date 24/9-2012
Tool Pegasus
Process Recipe nanobosch6
Tool conditioning 3 minute TDESC clean
Process duration 15 minutes
Purpose test
Characterisation SEM Zeiss


  • SEM images


Test run using AZ resist 24/9-2012

Process conditions
Substrate information Wafer C01296.09
Mask Travka80 mask in a few microns of AZ resist
Date 24/9-2012
Tool Pegasus
Process Recipe nanobosch6
Tool conditioning 3 minute TDESC clean
Process duration 15 minutes
Purpose test
Characterisation SEM Zeiss


  • SEM images
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