May 2011 Survey
Survey introduction
The May 2011 survey was the fifth survey carried out using a format where individual cleanroom users were asked about their view on various parts of using DTU Danchip's facilities and in particular the cleanroom facilities.
The questionaire was send to 198 registered users (based on the logging of cleanroom use) unfortunately 5 of the e-mail adresses was obsolete and thus the mails bounced, which brought the total number of potential answers to 193. In total 30 persons answered the questionaire which means an answer fraction of 15% regardless of whether or not the bounces should be included in the total.
This page deals with the comments given as part of the questionaire. Danchip values this feedback highly.
Comments
The comments appear here as they were written in the feedback field of the questionaire. In a few cases they have been anonymized or the worst spelling mistakes corrected.
Comment 1
It seems that the DRIE-pegasus suffers some serious load/unload issues. If these cannot be fixed it might be an idea to train a few 'super-users' in how to open the chamber, unload the wafers and clean the chuck manually. As it is now, if the machine goes 'out of use' in the afternoon it is not up and running until next morning.
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Comment 2
I am not satisfied only with the long queue for the EBL. This would be great if there is one more Electron Beam Lithography machine at Danchip.
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Comment 3
Not satisfied with the new training structure - it simply takes too long to be given training when you only have a few month for the project you are doing! Several times we have waited for weeks to get training. I think it would help a bit if you were told when your training vould start, but you are just told that you are on a list. I know the teachers are busy, but at least tell us when we can expect training in time not number on the list. But still the most anoying is that you have to wait for more than one ot two weeks. However i would like to note that when a person is helping you they are very helpful and there is no problem there.
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Comment 4
Failure reporting protocol could be made more strict and/or exhaustive ; equipment could be made to automatically report failure details to a central repository for more efficient analysis and solution. Great working environment.
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Comment 5
The status "limited use" should be better used for cases where equipment is not fully operational.Better control of chemicals is required (expire dates, regular replacements). Control limits for equipment and reaction plans for deviation are not always clear and well defined. For some tools there are no control procedures yet although the tools are operational for long time now (SSE spinner, Pegasus).Control and regular adjustment of back side alignment on the KS aligner is missing. We hope humidity control in RR3 is now improved. Last year it was impossible to run lithography during summer time.
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Comment 6
Der går nogen gange ret lang tid fra man har sendt en mail til training@danchip.dtu.dk til man får et svar. Det ville være rart med et auto-svar, bare så man ved, at ens mail ikke er forsvundet ud i den blå luft.
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Comment 7
Performance of equipment: I have put the rate at satisfied, but it is on the borderline of being unsatisfied. Lately I think there is several pieces of equipment that have been failing, although mostly for short periods. Would it not be possible to have more rigoriously maintenance, thereby preventing some of the downperiods?
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Comment 8
I always feel that the cleanroom is operating very well. When a machine breaks down or there is maintenance Danchip is quick to inform once they have an estimate. The staff is always pleasant and helpful. Furthermore the Danchip staff excel meeting a challenge. You come to them with some wild ideas or requirements and they will do their very best to assist you in defining this in a cleanroom procedure.
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Comment 9
Many pieces of equipment have been out of use extensively and others are performing far from an acceptable spec.
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Comment 10
Nogle gange er begge bageplader på SSE spinneren efterladt ved en høj temperatur, så man skal vente op til 45 min på at kunne spinne almindelig AZ resist. Hvorfor er det begge bageplader der varmes op til 180C under nogle processer? Kan man ikke lave den ene bageplade dedikeret til 90/100C til AZ resist?
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Comment 11
It took far too long for me to start training on any machine. After my training started I had no problems getting time with the staff but before this it was impossible to accomplish anything...therefore I would suggest to put more people in charge of customer service / training in order to speed up the 3 weeks from initial contact to the start if my training.
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Comment 12
Det er lidt kritisk med ventetiden for at få oplæring for dem der har projekter som skal afsluttes. Nu har det ikke været noget problem for mig da der har været andre ting at lave, men for andre kan jeg godt forestille mig det ikke er godt nok.
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