Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/EM with resist mask

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Looking at bit on the effect of using electromagnets for etching SiO2 with DUV resist

Unless otherwise stated, all content in this section was done by Berit Herstrøm, DTU Nanolab

  • Removing the H2 from the recipe to get less redeposition @ 200W platen power, EM:02/30A
  • Recipe name: SiO2_res, Recipe no. 10+EM+edit coils: C09975 coil_2500W, platen:200W, EM:02/30A, Pressure:8.8mTorr, C4F8:25.6sccm, He:448.7sccm, H2:0sccm, 3:56 min
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