Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/EM with resist mask

From LabAdviser
< Specific Process Knowledge‎ | Etch‎ | DRIE-Pegasus‎ | Pegasus-4‎ | SiO2 Etch
Revision as of 08:26, 11 September 2023 by Bghe (talk | contribs) (Created page with "==Looking at bit on the effect of using electromagnets for etching SiO2 with DUV resist== {{}}")
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)

Looking at bit on the effect of using electromagnets for etching SiO2 with DUV resist

{{}}

Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2_Etch/EM_with_resist_mask&oldid=47387"